Keyphrases
Electrical Properties
80%
Structural Properties
58%
Ferroelectric Properties
42%
Multiferroic Properties
38%
Chemical Solution Deposition Method
32%
Pt(111)
27%
Leakage Current Density
26%
Applied Electric Field
24%
Si (100) Substrate
23%
Silica
20%
Low Leakage Current
17%
BiFeO3 Thin Film
17%
Aurivillius
16%
Chemical Solution Deposition
15%
BiFeO3
14%
High Remnant Polarization
13%
Microstructural Properties
13%
Single Crystal
12%
Bi6Fe2Ti3O18
12%
Na0.5Bi4.5Ti4O15
12%
Coercive Field
11%
Aurivillius Phase
10%
Two Dimensional
9%
Ti(IV)
9%
Room Temperature
8%
X Ray Diffraction
8%
Remnant Polarization
8%
Ion Doping
8%
Orthorhombic Structure
7%
V Doping
7%
Oxygen Vacancy
7%
O 18
7%
Hysteresis Loop
6%
N-doping
6%
Optical Properties
6%
Y Doping
6%
Microstructure Properties
6%
La Doping
6%
Nanosheets
6%
Double-layer Thin Films
6%
Bi2Fe4O9
6%
Zn-Co
6%
Nd Doping
6%
Tb Doping
6%
Ge-doped ZnO
6%
Perovskite Single Crystals
6%
Organolead Halide
6%
Ho Doping
6%
X-ray Raman Spectroscopy
5%
X-ray Diffraction Spectroscopy
5%
Material Science
Thin Films
100%
Multiferroic Material
40%
Ferroelectricity
35%
Solution (Chemistry)
34%
Density
15%
Single Crystal
15%
Bismuth Ferrite
12%
Ferroelectric Material
10%
ZnO
9%
Halide
9%
X-Ray Diffraction
8%
Oxygen Vacancy
6%
Optical Property
6%
Nanosheet
6%
Silicon
6%
Nanocomposite
6%
Photoluminescence
5%