Adaptive modeling of the femtosecond inscription in silica

Vladimir Mezentsev; Jovana Petrovic; Jürgen Dreher; Rainer Grauer

doi:10.1117/12.647303

Adaptive modeling of the femtosecond inscription in silica

Vladimir Mezentsev^*, Jovana Petrovic, Jürgen Dreher, Rainer Grauer

^*Corresponding author for this work

Aston Institute of Photonic Technologies (AiPT)

Research output: Contribution to journal › Conference article › peer-review

Abstract

We present an adaptive mesh approach to high performance comprehensive investigation of dynamics of light and plasma pattens during the process of direct laser inscription. The results reveal extreme variations of spatial and temporal scales and tremendous complexity of these patterns which was not feasible to study previously.

Original language	English
Article number	61070R
Journal	Proceedings of SPIE - International Society for Optical Engineering
Volume	6107
DOIs	https://doi.org/10.1117/12.647303
Publication status	Published - 23 Feb 2006
Event	Laser-based Micropackaging - San Jose, CA Duration: 1 Jan 2006 → 1 Jan 2006

Bibliographical note

Copyright 2006 SPIE. One print or electronic copy may be made for personal use only. Systematic reproduction, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.

Keywords

Adaptive mesh refinement
Femtosecond inscription
Self-focusing

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10.1117/12.647303

Adaptive modeling of the femtosecond inscription in silica
Copyright 2006 SPIE. One print or electronic copy may be made for personal use only. Systematic reproduction, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.
Final published version, 1.08 MB

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title = "Adaptive modeling of the femtosecond inscription in silica",

abstract = "We present an adaptive mesh approach to high performance comprehensive investigation of dynamics of light and plasma pattens during the process of direct laser inscription. The results reveal extreme variations of spatial and temporal scales and tremendous complexity of these patterns which was not feasible to study previously.",

keywords = "Adaptive mesh refinement, Femtosecond inscription, Self-focusing",

author = "Vladimir Mezentsev and Jovana Petrovic and J{\"u}rgen Dreher and Rainer Grauer",

note = "Copyright 2006 SPIE. One print or electronic copy may be made for personal use only. Systematic reproduction, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited. ; Laser-based Micropackaging ; Conference date: 01-01-2006 Through 01-01-2006",

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AU - Mezentsev, Vladimir

AU - Petrovic, Jovana

AU - Dreher, Jürgen

AU - Grauer, Rainer

N1 - Copyright 2006 SPIE. One print or electronic copy may be made for personal use only. Systematic reproduction, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.

PY - 2006/2/23

Y1 - 2006/2/23

N2 - We present an adaptive mesh approach to high performance comprehensive investigation of dynamics of light and plasma pattens during the process of direct laser inscription. The results reveal extreme variations of spatial and temporal scales and tremendous complexity of these patterns which was not feasible to study previously.

AB - We present an adaptive mesh approach to high performance comprehensive investigation of dynamics of light and plasma pattens during the process of direct laser inscription. The results reveal extreme variations of spatial and temporal scales and tremendous complexity of these patterns which was not feasible to study previously.

KW - Adaptive mesh refinement

KW - Femtosecond inscription

KW - Self-focusing

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M3 - Conference article

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JO - Proceedings of SPIE - International Society for Optical Engineering

JF - Proceedings of SPIE - International Society for Optical Engineering

M1 - 61070R

T2 - Laser-based Micropackaging

Y2 - 1 January 2006 through 1 January 2006

ER -

Adaptive modeling of the femtosecond inscription in silica

Abstract

Bibliographical note

Keywords

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