We present an adaptive mesh approach to high performance comprehensive investigation of dynamics of light and plasma pattens during the process of direct laser inscription. The results reveal extreme variations of spatial and temporal scales and tremendous complexity of these patterns which was not feasible to study previously.
|Journal||Proceedings of SPIE - International Society for Optical Engineering|
|Publication status||Published - 23 Feb 2006|
|Event||Laser-based Micropackaging - San Jose, CA|
Duration: 1 Jan 2006 → 1 Jan 2006
Bibliographical noteCopyright 2006 SPIE. One print or electronic copy may be made for personal use only. Systematic reproduction, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.
- Adaptive mesh refinement
- Femtosecond inscription