Adaptive modeling of the femtosecond inscription in silica

Vladimir Mezentsev*, Jovana Petrovic, Jürgen Dreher, Rainer Grauer

*Corresponding author for this work

Research output: Contribution to journalConference article

Abstract

We present an adaptive mesh approach to high performance comprehensive investigation of dynamics of light and plasma pattens during the process of direct laser inscription. The results reveal extreme variations of spatial and temporal scales and tremendous complexity of these patterns which was not feasible to study previously.

Original languageEnglish
Article number61070R
JournalProceedings of SPIE - International Society for Optical Engineering
Volume6107
DOIs
Publication statusPublished - 23 Feb 2006
EventLaser-based Micropackaging - San Jose, CA
Duration: 1 Jan 20061 Jan 2006

Bibliographical note

Copyright 2006 SPIE. One print or electronic copy may be made for personal use only. Systematic reproduction, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.

Keywords

  • Adaptive mesh refinement
  • Femtosecond inscription
  • Self-focusing

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