TY - JOUR
T1 - Advantage of Optical Fast OFDM Over OFDM in Residual Frequency Offset Compensation
AU - Zhao, Jian
AU - Ellis, Andrew
PY - 2012/12/15
Y1 - 2012/12/15
N2 - We analyze the intercarrier interference (ICI) induced by residual frequency offset (RFO) in optical fast orthogonal frequency division multiplexing (F-OFDM) and compare this scheme with conventional OFDM in two scenarios: (1) the same RFO to subcarrier spacing ratio, and (2) the same discrete cosine or Fourier transform point size. In both scenarios, the ICI on a subcarrier in F-OFDM is dominated by the adjacent subcarriers, but the contribution to that in conventional OFDM is dispersed across the subcarriers. 19.5-GBaud 16QAM and 4ASK F-OFDM systems are investigated. 16QAM F-OFDM exhibits an RFO tolerance up to six times greater than that of 16QAM OFDM, when equalizers with the same tap number are used for the RFO compensation. 4ASK F-OFDM using 1-tap equalizers can achieve an RFO tolerance of up to four times greater than that of five-tap equalizer-based 4ASK OFDM.
AB - We analyze the intercarrier interference (ICI) induced by residual frequency offset (RFO) in optical fast orthogonal frequency division multiplexing (F-OFDM) and compare this scheme with conventional OFDM in two scenarios: (1) the same RFO to subcarrier spacing ratio, and (2) the same discrete cosine or Fourier transform point size. In both scenarios, the ICI on a subcarrier in F-OFDM is dominated by the adjacent subcarriers, but the contribution to that in conventional OFDM is dispersed across the subcarriers. 19.5-GBaud 16QAM and 4ASK F-OFDM systems are investigated. 16QAM F-OFDM exhibits an RFO tolerance up to six times greater than that of 16QAM OFDM, when equalizers with the same tap number are used for the RFO compensation. 4ASK F-OFDM using 1-tap equalizers can achieve an RFO tolerance of up to four times greater than that of five-tap equalizer-based 4ASK OFDM.
UR - http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000312022900002&KeyUID=WOS:000312022900002
UR - https://ieeexplore.ieee.org/document/6327594
U2 - 10.1109/lpt.2012.2223457
DO - 10.1109/lpt.2012.2223457
M3 - Article
SN - 1041-1135
VL - 24
SP - 2284
EP - 2287
JO - IEEE Photonics Technology Letters
JF - IEEE Photonics Technology Letters
IS - 24
ER -