Anodic dissolution growth of metal-organic framework HKUST-1 monitored:  Via in situ electrochemical atomic force microscopy

Stephen D. Worrall; Mark A. Bissett; Martin P. Attfield; Robert A.W. Dryfe

doi:10.1039/c8ce00761f

Anodic dissolution growth of metal-organic framework HKUST-1 monitored: Via in situ electrochemical atomic force microscopy

Stephen D. Worrall^*
, Mark A. Bissett
, Martin P. Attfield
, Robert A.W. Dryfe

^*Corresponding author for this work

University of Manchester

Research output: Contribution to journal › Article › peer-review

20 Citations (SciVal)

63 Downloads (Pure)

Abstract

In situ electrochemical atomic force microscopy (ec-AFM) is utilised for the first time to probe the initial stages of metal-organic framework (MOF) coating growth via anodic dissolution. Using the example of the Cu MOF HKUST-1, real time surface analysis is obtained that supports and verifies many of the reaction steps in a previously proposed mechanism for this type of coating growth. No evidence is observed however for the presence or formation of Cu₂O, which has previously been suggested to be both key for the formation of the coating and a potential explanation for the anomalously high adhesion strength of coatings obtained via this methodology. Supporting in situ electrochemical Raman spectroscopy also fails to detect the presence of any significant amount of Cu₂O before or during the coating's growth process.

Original language	English
Pages (from-to)	4421-4427
Number of pages	7
Journal	Crystengcomm
Volume	20
Issue number	31
DOIs	https://doi.org/10.1039/c8ce00761f
Publication status	Published - 25 Jun 2018

Bibliographical note

Funding

SDW would like to thank Dr Hollie Patten, Dr Deborah Lomax and Shiyu Xu for advice and training on the use of and data analysis from the in situ ec-AFM set up. SDW would like to thank the NoWNANO DTC and EPSRC for funding.

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Cite this

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title = "Anodic dissolution growth of metal-organic framework HKUST-1 monitored: Via in situ electrochemical atomic force microscopy",

abstract = "In situ electrochemical atomic force microscopy (ec-AFM) is utilised for the first time to probe the initial stages of metal-organic framework (MOF) coating growth via anodic dissolution. Using the example of the Cu MOF HKUST-1, real time surface analysis is obtained that supports and verifies many of the reaction steps in a previously proposed mechanism for this type of coating growth. No evidence is observed however for the presence or formation of Cu2O, which has previously been suggested to be both key for the formation of the coating and a potential explanation for the anomalously high adhesion strength of coatings obtained via this methodology. Supporting in situ electrochemical Raman spectroscopy also fails to detect the presence of any significant amount of Cu2O before or during the coating's growth process.",

author = "Worrall, \{Stephen D.\} and Bissett, \{Mark A.\} and Attfield, \{Martin P.\} and Dryfe, \{Robert A.W.\}",

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