Bragg Gratings Inscription in TS-Doped PMMA POF by Using 248-nm KrF Pulses

Rui Min; Beatriz Ortega; Xuehao Hu; Christian Broadway; Christophe Caucheteur; Chi-Fung Jeff pun; Hwa-Yaw Tam; Paulo Antunes; Carlos Marques

doi:10.1109/LPT.2018.2863741

Bragg Gratings Inscription in TS-Doped PMMA POF by Using 248-nm KrF Pulses

Rui Min
, Beatriz Ortega
, Xuehao Hu
, Christian Broadway
, Christophe Caucheteur
, Chi-Fung Jeff pun
, Hwa-Yaw Tam
, Paulo Antunes
, Carlos Marques

Electronics & Computer Engineering

Research output: Contribution to journal › Article › peer-review

10 Citations (Scopus)

Abstract

We demonstrate the Bragg gratings inscription in the 850-nm spectral region by using trans-4-stilbenemethanol-doped poly methyl methacrylate step-index optical fiber and a 248-nm krypton fluoride (KrF) excimer laser system. The gratings inscription only takes 0.4 s. A detailed study of the grating fabrication process using different pulse repetition rates is also reported. In addition, temperature, humidity, and strain sensitivities are measured to demonstrate the potentiality of these components for different sensing applications.

Original language	English
Pages (from-to)	1609-1612
Journal	IEEE Photonics Technology Letters
Volume	30
Issue number	18
Early online date	6 Aug 2018
DOIs	https://doi.org/10.1109/LPT.2018.2863741
Publication status	Published - 15 Sept 2018

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10.1109/LPT.2018.2863741

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title = "Bragg Gratings Inscription in TS-Doped PMMA POF by Using 248-nm KrF Pulses",

abstract = "We demonstrate the Bragg gratings inscription in the 850-nm spectral region by using trans-4-stilbenemethanol-doped poly methyl methacrylate step-index optical fiber and a 248-nm krypton fluoride (KrF) excimer laser system. The gratings inscription only takes 0.4 s. A detailed study of the grating fabrication process using different pulse repetition rates is also reported. In addition, temperature, humidity, and strain sensitivities are measured to demonstrate the potentiality of these components for different sensing applications.",

author = "Rui Min and Beatriz Ortega and Xuehao Hu and Christian Broadway and Christophe Caucheteur and \{Jeff pun\}, Chi-Fung and Hwa-Yaw Tam and Paulo Antunes and Carlos Marques",

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doi = "10.1109/LPT.2018.2863741",

language = "English",

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T1 - Bragg Gratings Inscription in TS-Doped PMMA POF by Using 248-nm KrF Pulses

AU - Min, Rui

AU - Ortega, Beatriz

AU - Hu, Xuehao

AU - Broadway, Christian

AU - Caucheteur, Christophe

AU - Jeff pun, Chi-Fung

AU - Tam, Hwa-Yaw

AU - Antunes, Paulo

AU - Marques, Carlos

PY - 2018/9/15

Y1 - 2018/9/15

N2 - We demonstrate the Bragg gratings inscription in the 850-nm spectral region by using trans-4-stilbenemethanol-doped poly methyl methacrylate step-index optical fiber and a 248-nm krypton fluoride (KrF) excimer laser system. The gratings inscription only takes 0.4 s. A detailed study of the grating fabrication process using different pulse repetition rates is also reported. In addition, temperature, humidity, and strain sensitivities are measured to demonstrate the potentiality of these components for different sensing applications.

AB - We demonstrate the Bragg gratings inscription in the 850-nm spectral region by using trans-4-stilbenemethanol-doped poly methyl methacrylate step-index optical fiber and a 248-nm krypton fluoride (KrF) excimer laser system. The gratings inscription only takes 0.4 s. A detailed study of the grating fabrication process using different pulse repetition rates is also reported. In addition, temperature, humidity, and strain sensitivities are measured to demonstrate the potentiality of these components for different sensing applications.

UR - https://ieeexplore.ieee.org/document/8426016

U2 - 10.1109/LPT.2018.2863741

DO - 10.1109/LPT.2018.2863741

M3 - Article

SN - 1041-1135

VL - 30

SP - 1609

EP - 1612

JO - IEEE Photonics Technology Letters

JF - IEEE Photonics Technology Letters

IS - 18

ER -

Bragg Gratings Inscription in TS-Doped PMMA POF by Using 248-nm KrF Pulses

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