Electron beam lithography of phase mask gratings for near field holographic production of optical fibre gratings

X. Liu*, J.S. Aitchison, R.M. De La Rue, S. Thoms, L. Zhang, J.A.R. Williams, I. Bennion

*Corresponding author for this work

Research output: Contribution to journalArticle

Abstract

This paper reports on processing methods used to produce phase masks for near field holographic writing of fibre gratings. The masks are produced using e-beam lithography (EBL) and reactive ion etching (RIE). We shall discuss the relations between grating parameters such as ridge duty cycle and groove-depth and processing conditions such as exposure dose and resist profiles.

Original languageEnglish
Pages (from-to)345-348
Number of pages4
JournalMicroelectronic Engineering
Volume35
Issue number1-4
DOIs
Publication statusPublished - Feb 1997
EventInternational conference on micro- and nano-engineering 96 - Glasgow, United Kingdom
Duration: 22 Sep 199625 Sep 1996

Fingerprint

Electron beam lithography
Optical fibers
Masks
near fields
masks
lithography
optical fibers
gratings
electron beams
Reactive ion etching
Processing
grooves
Lithography
ridges
etching
dosage
cycles
fibers
Fibers
profiles

Keywords

  • processing methods
  • phase masks
  • near field holographic writing
  • fibre gratings
  • e-beam lithograph
  • EBL
  • reactive ion etching
  • RIE
  • ridge duty cycle
  • groove-depth
  • exposure dose
  • resist profiles

Cite this

Liu, X. ; Aitchison, J.S. ; De La Rue, R.M. ; Thoms, S. ; Zhang, L. ; Williams, J.A.R. ; Bennion, I. / Electron beam lithography of phase mask gratings for near field holographic production of optical fibre gratings. In: Microelectronic Engineering. 1997 ; Vol. 35, No. 1-4. pp. 345-348.
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abstract = "This paper reports on processing methods used to produce phase masks for near field holographic writing of fibre gratings. The masks are produced using e-beam lithography (EBL) and reactive ion etching (RIE). We shall discuss the relations between grating parameters such as ridge duty cycle and groove-depth and processing conditions such as exposure dose and resist profiles.",
keywords = "processing methods, phase masks, near field holographic writing, fibre gratings, e-beam lithograph, EBL, reactive ion etching, RIE, ridge duty cycle, groove-depth, exposure dose, resist profiles",
author = "X. Liu and J.S. Aitchison and {De La Rue}, R.M. and S. Thoms and L. Zhang and J.A.R. Williams and I. Bennion",
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Electron beam lithography of phase mask gratings for near field holographic production of optical fibre gratings. / Liu, X.; Aitchison, J.S.; De La Rue, R.M.; Thoms, S.; Zhang, L.; Williams, J.A.R.; Bennion, I.

In: Microelectronic Engineering, Vol. 35, No. 1-4, 02.1997, p. 345-348.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Electron beam lithography of phase mask gratings for near field holographic production of optical fibre gratings

AU - Liu, X.

AU - Aitchison, J.S.

AU - De La Rue, R.M.

AU - Thoms, S.

AU - Zhang, L.

AU - Williams, J.A.R.

AU - Bennion, I.

PY - 1997/2

Y1 - 1997/2

N2 - This paper reports on processing methods used to produce phase masks for near field holographic writing of fibre gratings. The masks are produced using e-beam lithography (EBL) and reactive ion etching (RIE). We shall discuss the relations between grating parameters such as ridge duty cycle and groove-depth and processing conditions such as exposure dose and resist profiles.

AB - This paper reports on processing methods used to produce phase masks for near field holographic writing of fibre gratings. The masks are produced using e-beam lithography (EBL) and reactive ion etching (RIE). We shall discuss the relations between grating parameters such as ridge duty cycle and groove-depth and processing conditions such as exposure dose and resist profiles.

KW - processing methods

KW - phase masks

KW - near field holographic writing

KW - fibre gratings

KW - e-beam lithograph

KW - EBL

KW - reactive ion etching

KW - RIE

KW - ridge duty cycle

KW - groove-depth

KW - exposure dose

KW - resist profiles

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