Electron beam lithography of phase mask gratings for near field holographic production of optical fibre gratings

X. Liu*, J.S. Aitchison, R.M. De La Rue, S. Thoms, L. Zhang, J.A.R. Williams, I. Bennion

*Corresponding author for this work

Research output: Contribution to journalArticle

Abstract

This paper reports on processing methods used to produce phase masks for near field holographic writing of fibre gratings. The masks are produced using e-beam lithography (EBL) and reactive ion etching (RIE). We shall discuss the relations between grating parameters such as ridge duty cycle and groove-depth and processing conditions such as exposure dose and resist profiles.

Original languageEnglish
Pages (from-to)345-348
Number of pages4
JournalMicroelectronic Engineering
Volume35
Issue number1-4
DOIs
Publication statusPublished - Feb 1997
EventInternational conference on micro- and nano-engineering 96 - Glasgow, United Kingdom
Duration: 22 Sep 199625 Sep 1996

Keywords

  • processing methods
  • phase masks
  • near field holographic writing
  • fibre gratings
  • e-beam lithograph
  • EBL
  • reactive ion etching
  • RIE
  • ridge duty cycle
  • groove-depth
  • exposure dose
  • resist profiles

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