Electron beam lithography of phase mask gratings for near field holographic production of optical fibre gratings

X. Liu; J.S. Aitchison; R.M. De La Rue; S. Thoms; L. Zhang; J.A.R. Williams; I. Bennion

doi:10.1016/S0167-9317(96)00102-5

Electron beam lithography of phase mask gratings for near field holographic production of optical fibre gratings

X. Liu^*
, J.S. Aitchison
, R.M. De La Rue
, S. Thoms
, L. Zhang
, J.A.R. Williams
, I. Bennion

^*Corresponding author for this work

Aston Institute of Photonic Technologies (AiPT)

Research output: Contribution to journal › Article › peer-review

8 Citations (Scopus)

Abstract

This paper reports on processing methods used to produce phase masks for near field holographic writing of fibre gratings. The masks are produced using e-beam lithography (EBL) and reactive ion etching (RIE). We shall discuss the relations between grating parameters such as ridge duty cycle and groove-depth and processing conditions such as exposure dose and resist profiles.

Original language	English
Pages (from-to)	345-348
Number of pages	4
Journal	Microelectronic Engineering
Volume	35
Issue number	1-4
DOIs	https://doi.org/10.1016/S0167-9317(96)00102-5
Publication status	Published - Feb 1997
Event	International conference on micro- and nano-engineering 96 - Glasgow, United Kingdom Duration: 22 Sept 1996 → 25 Sept 1996

Keywords

processing methods
phase masks
near field holographic writing
fibre gratings
e-beam lithograph
EBL
reactive ion etching
RIE
ridge duty cycle
groove-depth
exposure dose
resist profiles

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10.1016/S0167-9317(96)00102-5

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title = "Electron beam lithography of phase mask gratings for near field holographic production of optical fibre gratings",

abstract = "This paper reports on processing methods used to produce phase masks for near field holographic writing of fibre gratings. The masks are produced using e-beam lithography (EBL) and reactive ion etching (RIE). We shall discuss the relations between grating parameters such as ridge duty cycle and groove-depth and processing conditions such as exposure dose and resist profiles.",

keywords = "processing methods, phase masks, near field holographic writing, fibre gratings, e-beam lithograph, EBL, reactive ion etching, RIE, ridge duty cycle, groove-depth, exposure dose, resist profiles",

author = "X. Liu and J.S. Aitchison and \{De La Rue\}, R.M. and S. Thoms and L. Zhang and J.A.R. Williams and I. Bennion",

year = "1997",

month = feb,

doi = "10.1016/S0167-9317(96)00102-5",

language = "English",

volume = "35",

pages = "345--348",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier",

number = "1-4",

note = "International conference on micro- and nano-engineering 96 ; Conference date: 22-09-1996 Through 25-09-1996",

}

TY - JOUR

T1 - Electron beam lithography of phase mask gratings for near field holographic production of optical fibre gratings

AU - Liu, X.

AU - Aitchison, J.S.

AU - De La Rue, R.M.

AU - Thoms, S.

AU - Zhang, L.

AU - Williams, J.A.R.

AU - Bennion, I.

PY - 1997/2

Y1 - 1997/2

N2 - This paper reports on processing methods used to produce phase masks for near field holographic writing of fibre gratings. The masks are produced using e-beam lithography (EBL) and reactive ion etching (RIE). We shall discuss the relations between grating parameters such as ridge duty cycle and groove-depth and processing conditions such as exposure dose and resist profiles.

AB - This paper reports on processing methods used to produce phase masks for near field holographic writing of fibre gratings. The masks are produced using e-beam lithography (EBL) and reactive ion etching (RIE). We shall discuss the relations between grating parameters such as ridge duty cycle and groove-depth and processing conditions such as exposure dose and resist profiles.

KW - processing methods

KW - phase masks

KW - near field holographic writing

KW - fibre gratings

KW - e-beam lithograph

KW - EBL

KW - reactive ion etching

KW - RIE

KW - ridge duty cycle

KW - groove-depth

KW - exposure dose

KW - resist profiles

UR - https://www.scopus.com/pages/publications/0031073872

UR - http://www.sciencedirect.com/science/article/pii/S0167931796001025

U2 - 10.1016/S0167-9317(96)00102-5

DO - 10.1016/S0167-9317(96)00102-5

M3 - Article

SN - 0167-9317

VL - 35

SP - 345

EP - 348

JO - Microelectronic Engineering

JF - Microelectronic Engineering

IS - 1-4

T2 - International conference on micro- and nano-engineering 96

Y2 - 22 September 1996 through 25 September 1996

ER -

Electron beam lithography of phase mask gratings for near field holographic production of optical fibre gratings

Abstract

Keywords

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