Enhancement of photocatalytic efficiency using heterostructured SiO2–Ta2O5 thin films

Arabinda Baruah, Menaka Jha, Santosh Kumar, Ashok Kumar Ganguli

Research output: Contribution to journalArticle

Abstract

Fabrication of controlled layered structured thin films with tunable physical properties is an important area of research as thin film technology holds potential for a variety of industrial applications. In the present work, we have demonstrated the process for fabrication of multilayer films of silica and tantalum oxide by Langmuir–Blodgett film fabrication technique and investigated their photocatalytic degradation efficiency for organic dye (Rhodamine B) under UV radiation. The photocatalytic degradation of RhB in presence of SiO2–Ta2O5 exhibited remarkably enhanced photocatalytic activity than pure Ta2O5. This is because of the high separation efficiency of photo-generated electron–hole pair due to the Lewis acidity of silica and the greater contact area between these two layers. The SiO2–Ta2O5 system was optimized for the number of self-assembled layers of silica and tantalum oxide, and it has been found that 10S–15T–10S–15T–10S–15T (where S and T represents SiO2 and Ta2O5 respectively) pattern has been found to have maximum photocatalytic degradation efficiency of 71% (with 18% degradation per unit area of the film) which is 3.5 fold higher than pure Ta2O5 under identical experimental condition. Also, the photocatalytic activity of these films was also proved to be sensitive to the sequence of silica and tantalum oxide layers when the film area of all the samples was kept constant (3.75 cm2). Further analysis confirms that the degradation of dye molecules has been largely promoted by the photo generated holes, rather than the super oxide radical anions.
Original languageEnglish
Article number056404
Number of pages12
JournalMaterials Research Express
Volume2
Issue number5
DOIs
Publication statusPublished - 27 May 2015

Fingerprint

Tantalum oxides
Silicon Dioxide
Degradation
Thin films
Silica
rhodamine B
Fabrication
Coloring Agents
Dyes
Multilayer films
Acidity
Ultraviolet radiation
Oxides
Industrial applications
Anions
Negative ions
Physical properties
Molecules
tantalum oxide

Cite this

Baruah, Arabinda ; Jha, Menaka ; Kumar, Santosh ; Kumar Ganguli, Ashok. / Enhancement of photocatalytic efficiency using heterostructured SiO2–Ta2O5 thin films. In: Materials Research Express. 2015 ; Vol. 2, No. 5.
@article{17b48ac9e8c44fb08054be46dc4a4b0d,
title = "Enhancement of photocatalytic efficiency using heterostructured SiO2–Ta2O5 thin films",
abstract = "Fabrication of controlled layered structured thin films with tunable physical properties is an important area of research as thin film technology holds potential for a variety of industrial applications. In the present work, we have demonstrated the process for fabrication of multilayer films of silica and tantalum oxide by Langmuir–Blodgett film fabrication technique and investigated their photocatalytic degradation efficiency for organic dye (Rhodamine B) under UV radiation. The photocatalytic degradation of RhB in presence of SiO2–Ta2O5 exhibited remarkably enhanced photocatalytic activity than pure Ta2O5. This is because of the high separation efficiency of photo-generated electron–hole pair due to the Lewis acidity of silica and the greater contact area between these two layers. The SiO2–Ta2O5 system was optimized for the number of self-assembled layers of silica and tantalum oxide, and it has been found that 10S–15T–10S–15T–10S–15T (where S and T represents SiO2 and Ta2O5 respectively) pattern has been found to have maximum photocatalytic degradation efficiency of 71{\%} (with 18{\%} degradation per unit area of the film) which is 3.5 fold higher than pure Ta2O5 under identical experimental condition. Also, the photocatalytic activity of these films was also proved to be sensitive to the sequence of silica and tantalum oxide layers when the film area of all the samples was kept constant (3.75 cm2). Further analysis confirms that the degradation of dye molecules has been largely promoted by the photo generated holes, rather than the super oxide radical anions.",
author = "Arabinda Baruah and Menaka Jha and Santosh Kumar and {Kumar Ganguli}, Ashok",
year = "2015",
month = "5",
day = "27",
doi = "10.1088/2053-1591/2/5/056404",
language = "English",
volume = "2",
journal = "Materials Research Express",
issn = "2053-1591",
publisher = "IOP Publishing Ltd.",
number = "5",

}

Enhancement of photocatalytic efficiency using heterostructured SiO2–Ta2O5 thin films. / Baruah, Arabinda; Jha, Menaka; Kumar, Santosh; Kumar Ganguli, Ashok.

In: Materials Research Express, Vol. 2, No. 5, 056404, 27.05.2015.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Enhancement of photocatalytic efficiency using heterostructured SiO2–Ta2O5 thin films

AU - Baruah, Arabinda

AU - Jha, Menaka

AU - Kumar, Santosh

AU - Kumar Ganguli, Ashok

PY - 2015/5/27

Y1 - 2015/5/27

N2 - Fabrication of controlled layered structured thin films with tunable physical properties is an important area of research as thin film technology holds potential for a variety of industrial applications. In the present work, we have demonstrated the process for fabrication of multilayer films of silica and tantalum oxide by Langmuir–Blodgett film fabrication technique and investigated their photocatalytic degradation efficiency for organic dye (Rhodamine B) under UV radiation. The photocatalytic degradation of RhB in presence of SiO2–Ta2O5 exhibited remarkably enhanced photocatalytic activity than pure Ta2O5. This is because of the high separation efficiency of photo-generated electron–hole pair due to the Lewis acidity of silica and the greater contact area between these two layers. The SiO2–Ta2O5 system was optimized for the number of self-assembled layers of silica and tantalum oxide, and it has been found that 10S–15T–10S–15T–10S–15T (where S and T represents SiO2 and Ta2O5 respectively) pattern has been found to have maximum photocatalytic degradation efficiency of 71% (with 18% degradation per unit area of the film) which is 3.5 fold higher than pure Ta2O5 under identical experimental condition. Also, the photocatalytic activity of these films was also proved to be sensitive to the sequence of silica and tantalum oxide layers when the film area of all the samples was kept constant (3.75 cm2). Further analysis confirms that the degradation of dye molecules has been largely promoted by the photo generated holes, rather than the super oxide radical anions.

AB - Fabrication of controlled layered structured thin films with tunable physical properties is an important area of research as thin film technology holds potential for a variety of industrial applications. In the present work, we have demonstrated the process for fabrication of multilayer films of silica and tantalum oxide by Langmuir–Blodgett film fabrication technique and investigated their photocatalytic degradation efficiency for organic dye (Rhodamine B) under UV radiation. The photocatalytic degradation of RhB in presence of SiO2–Ta2O5 exhibited remarkably enhanced photocatalytic activity than pure Ta2O5. This is because of the high separation efficiency of photo-generated electron–hole pair due to the Lewis acidity of silica and the greater contact area between these two layers. The SiO2–Ta2O5 system was optimized for the number of self-assembled layers of silica and tantalum oxide, and it has been found that 10S–15T–10S–15T–10S–15T (where S and T represents SiO2 and Ta2O5 respectively) pattern has been found to have maximum photocatalytic degradation efficiency of 71% (with 18% degradation per unit area of the film) which is 3.5 fold higher than pure Ta2O5 under identical experimental condition. Also, the photocatalytic activity of these films was also proved to be sensitive to the sequence of silica and tantalum oxide layers when the film area of all the samples was kept constant (3.75 cm2). Further analysis confirms that the degradation of dye molecules has been largely promoted by the photo generated holes, rather than the super oxide radical anions.

UR - http://iopscience.iop.org/article/10.1088/2053-1591/2/5/056404/meta

U2 - 10.1088/2053-1591/2/5/056404

DO - 10.1088/2053-1591/2/5/056404

M3 - Article

VL - 2

JO - Materials Research Express

JF - Materials Research Express

SN - 2053-1591

IS - 5

M1 - 056404

ER -