High laser induced damage threshold photoresists for nano-imprint and 3D multi-photon lithography

Elmina Kabouraki; Vasileia Melissinaki; Amit Yadav; Andrius Melninkaitis; Konstantina Tourlouki; Theodoros Tachtsidis; Nikolaos Kehagias; Georgios D. Barmparis; Dimitris G. Papazoglou; Edik Rafailov; Maria Farsari

doi:10.1515/nanoph-2021-0263

High laser induced damage threshold photoresists for nano-imprint and 3D multi-photon lithography

Elmina Kabouraki, Vasileia Melissinaki, Amit Yadav, Andrius Melninkaitis, Konstantina Tourlouki, Theodoros Tachtsidis, Nikolaos Kehagias, Georgios D. Barmparis, Dimitris G. Papazoglou, Edik Rafailov, Maria Farsari

Research output: Contribution to journal › Article › peer-review

Abstract

Optics manufacturing technology is predicted to play a major role in the future production of integrated photonic circuits. One of the major drawbacks in the realization of photonic circuits is the damage of optical materials by intense laser pulses. Here, we report on the preparation of a series of organic-inorganic hybrid photoresists that exhibit enhanced laser-induced damage threshold. These photoresists showed to be candidates for the fabrication of micro-optical elements (MOEs) using three-dimensional multiphoton lithography. Moreover, they demonstrate pattern ability by nanoimprint lithography, making them suitable for future mass production of MOEs.

Original language	English
Pages (from-to)	3759-3768
Number of pages	10
Journal	Nanophotonics
Volume	10
Issue number	14
Early online date	23 Jul 2021
DOIs	https://doi.org/10.1515/nanoph-2021-0263
Publication status	Published - 2 Oct 2021

Bibliographical note

© 2021 Elmina Kabouraki et al., published by De Gruyter. This work is licensed under the Creative Commons Attribution 4.0
International License.

Funding: This work has received funding from
Laserlab-Europe, the European Union's Horizon 2020
research and innovation program under grant agreement
no 871124, and PULSE, the European Union’s Horizon 2020
research and innovation program under grant agreement
No 824996.

Keywords

3D printing
additive manufacturing
diffractive optical elements
laser damage
micro-optical elements
nano-imprint lithography

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10.1515/nanoph-2021-0263Licence: CC BY 3.0

High laser induced damage threshold photoresists
© 2021 Elmina Kabouraki et al., published by De Gruyter. This work is licensed under the Creative Commons Attribution 4.0 International License.
Proof, 1.63 MBLicence: CC BY 3.0
10.1515_nanoph-2021-0263
© 2021 Elmina Kabouraki et al., published by De Gruyter. This work is licensed under the Creative Commons Attribution 4.0 International License.
Final published version, 1.63 MBLicence: CC BY 3.0

Cite this

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title = "High laser induced damage threshold photoresists for nano-imprint and 3D multi-photon lithography",

abstract = "Optics manufacturing technology is predicted to play a major role in the future production of integrated photonic circuits. One of the major drawbacks in the realization of photonic circuits is the damage of optical materials by intense laser pulses. Here, we report on the preparation of a series of organic-inorganic hybrid photoresists that exhibit enhanced laser-induced damage threshold. These photoresists showed to be candidates for the fabrication of micro-optical elements (MOEs) using three-dimensional multiphoton lithography. Moreover, they demonstrate pattern ability by nanoimprint lithography, making them suitable for future mass production of MOEs.",

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AU - Papazoglou, Dimitris G.

AU - Rafailov, Edik

AU - Farsari, Maria

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High laser induced damage threshold photoresists for nano-imprint and 3D multi-photon lithography

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Keywords

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