High laser induced damage threshold photoresists for nano-imprint and 3D multi-photon lithography

Elmina Kabouraki, Vasileia Melissinaki, Amit Yadav, Andrius Melninkaitis, Konstantina Tourlouki, Theodoros Tachtsidis, Nikolaos Kehagias, Georgios D. Barmparis, Dimitris G. Papazoglou, Edik Rafailov, Maria Farsari

Research output: Contribution to journalArticlepeer-review

Abstract

Abstract Optics manufacturing technology is predicted to play a major role in the future production of integrated photonic circuits. One of the major drawbacks in the realization of photonic circuits is the damage of optical materials by intense laser pulses. Here, we report on the preparation of a series of organic–inorganic hybrid photoresists that exhibit enhanced laser-induced damage threshold. These photoresists showed to be candidates for the fabrication of micro-optical elements (MOEs) using three-dimensional multiphoton lithography. Moreover, they demonstrate pattern ability by nanoimprint lithography, making them suitable for future mass production of MOEs.
Original languageEnglish
Number of pages10
JournalNanophotonics
Early online date23 Jul 2021
DOIs
Publication statusE-pub ahead of print - 23 Jul 2021

Bibliographical note

© 2021 Elmina Kabouraki et al., published by De Gruyter. This work is licensed under the Creative Commons Attribution 4.0
International License.

Funding: This work has received funding from
Laserlab-Europe, the European Union's Horizon 2020
research and innovation program under grant agreement
no 871124, and PULSE, the European Union’s Horizon 2020
research and innovation program under grant agreement
No 824996.

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