Ion irradiation effects in nanocrystalline TiN coatings

H. Wang, R. Araujo, J.G. Swadener, Y.Q. Wang, X. Zhang, E.G. Fu, T. Cagin

Research output: Contribution to journalArticle

Abstract

Nitride materials and coatings have attracted extensive research interests for various applications in advanced nuclear reactors due to their unique combination of physical properties, including high temperature stability, excellent corrosion resistance, superior mechanical property and good thermal conductivity. In this paper, the ion irradiation effects in nanocrystalline TiN coatings as a function of grain size are reported. TiN thin films (thickness of 100 nm) with various grain sizes (8-100 nm) were prepared on Si substrates by a pulsed laser deposition technique. All the samples were irradiated with He ions to high fluences at room temperature. Transmission electron microscopy (TEM) and high resolution TEM on the ion-irradiated samples show that damage accumulation in the TiN films reduces as the grain size reduces. Electrical resistivity of the ion-irradiated films increases slightly compared with the as-deposited ones. These observations demonstrate a good radiation-tolerance property of nanocrystalline TiN films.
Original languageEnglish
Pages (from-to)1162-1166
Number of pages5
JournalNuclear Instruments and Methods in Physics Research: Section B
Volume261
Issue number1-2
Early online date29 Apr 2007
DOIs
Publication statusPublished - Aug 2007

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Bibliographical note

The Application of Accelerators in Research and Industry — Proceedings of the Nineteenth International Conference on The Application of Accelerators in Research and Industry

Keywords

  • ion irradiation effects
  • nanocrystalline
  • TEM
  • thin film
  • TiN

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