Mask-less lithography for fabrication of optical waveguides

Mykhaylo Dubov; S.R. Natarajan; John A.R. Williams; Ian Bennion

doi:10.1117/12.762594

Mask-less lithography for fabrication of optical waveguides

Mykhaylo Dubov, S.R. Natarajan, John A.R. Williams, Ian Bennion

Aston Institute of Photonic Technologies (AiPT)

Research output: Chapter in Book/Published conference output › Conference publication

Abstract

A flexible method for fabricating shallow optical waveguides by using femtosecond laser writing of patterns on a metal coated glass substrate followed by ion-exchange is described. This overcomes the drawbacks of low index contrast and high induced stress in waveguides directly written using low-repetition rate ultrafast laser systems. When compared to conventional lithography, the technique is simpler and has advantages in terms of flexibility in the types of structures which can be fabricated.

Original language	English
Title of host publication	Commercial and biomedical applications of ultrafast lasers VIII
Editors	Joseph Neev, Stefan Nolte, Alexander Heisterkamp, Christopher B. Schaffer
Publisher	SPIE
Pages	688110
Volume	6881
ISBN (Print)	978-0-8194-7056-0
DOIs	https://doi.org/10.1117/12.762594
Publication status	Published - 15 Feb 2008
Event	Commercial and Biomedical Applications of Ultrafast Lasers VIII - San Jose, CA, United States Duration: 20 Jan 2008 → 23 Jan 2008

Publication series

Name	SPIE proceedings
Publisher	SPIE
Volume	6881
ISSN (Print)	0277-786X

Conference

Conference	Commercial and Biomedical Applications of Ultrafast Lasers VIII
Country/Territory	United States
City	San Jose, CA
Period	20/01/08 → 23/01/08

Bibliographical note

M. Dubov ; S. R. Natarajan ; J. A. R. Williams and I. Bennion
"Mask-less lithography for fabrication of optical waveguides", Proc. SPIE 6881, Commercial and Biomedical Applications of Ultrafast Lasers VIII, 688110 (February 15, 2008); doi:10.1117/12.762594.

Copyright 2008 Society of Photo-Optical Instrumentation Engineers. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.

http://dx.doi.org/10.1117/12.762594

Keywords

glass
ion exchange
lithography
substrates
ultrashort pulses
femtosecond lithography
mask-less
planar lightwave circuit

Access to Document

10.1117/12.762594

Mask-less lithography for fabrication of optical waveguides
M. Dubov ; S. R. Natarajan ; J. A. R. Williams and I. Bennion "Mask-less lithography for fabrication of optical waveguides", Proc. SPIE 6881, Commercial and Biomedical Applications of Ultrafast Lasers VIII, 688110 (February 15, 2008); doi:10.1117/12.762594. Copyright 2008 Society of Photo-Optical Instrumentation Engineers. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited. http://dx.doi.org/10.1117/12.762594
Final published version, 10.6 MB

Cite this

@inproceedings{42e0fd250eb04d8bbfaf34caf9e07c6d,

title = "Mask-less lithography for fabrication of optical waveguides",

abstract = "A flexible method for fabricating shallow optical waveguides by using femtosecond laser writing of patterns on a metal coated glass substrate followed by ion-exchange is described. This overcomes the drawbacks of low index contrast and high induced stress in waveguides directly written using low-repetition rate ultrafast laser systems. When compared to conventional lithography, the technique is simpler and has advantages in terms of flexibility in the types of structures which can be fabricated.",

keywords = "glass, ion exchange, lithography, substrates, ultrashort pulses, femtosecond lithography, mask-less, planar lightwave circuit",

author = "Mykhaylo Dubov and S.R. Natarajan and Williams, {John A.R.} and Ian Bennion",

note = "M. Dubov ; S. R. Natarajan ; J. A. R. Williams and I. Bennion {"}Mask-less lithography for fabrication of optical waveguides{"}, Proc. SPIE 6881, Commercial and Biomedical Applications of Ultrafast Lasers VIII, 688110 (February 15, 2008); doi:10.1117/12.762594. Copyright 2008 Society of Photo-Optical Instrumentation Engineers. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited. http://dx.doi.org/10.1117/12.762594; Commercial and Biomedical Applications of Ultrafast Lasers VIII ; Conference date: 20-01-2008 Through 23-01-2008",

year = "2008",

month = feb,

day = "15",

doi = "10.1117/12.762594",

language = "English",

isbn = "978-0-8194-7056-0",

volume = "6881",

series = "SPIE proceedings",

publisher = "SPIE",

pages = "688110",

editor = "Joseph Neev and Stefan Nolte and Alexander Heisterkamp and Schaffer, {Christopher B.}",

booktitle = "Commercial and biomedical applications of ultrafast lasers VIII",

address = "United States",

}

Dubov, M, Natarajan, SR, Williams, JAR & Bennion, I 2008, Mask-less lithography for fabrication of optical waveguides. in J Neev, S Nolte, A Heisterkamp & CB Schaffer (eds), Commercial and biomedical applications of ultrafast lasers VIII. vol. 6881, SPIE proceedings, vol. 6881, SPIE, pp. 688110, Commercial and Biomedical Applications of Ultrafast Lasers VIII, San Jose, CA, United States, 20/01/08. https://doi.org/10.1117/12.762594

Mask-less lithography for fabrication of optical waveguides. / Dubov, Mykhaylo; Natarajan, S.R.; Williams, John A.R. et al.
Commercial and biomedical applications of ultrafast lasers VIII. ed. / Joseph Neev; Stefan Nolte; Alexander Heisterkamp; Christopher B. Schaffer. Vol. 6881 SPIE, 2008. p. 688110 (SPIE proceedings; Vol. 6881).

Research output: Chapter in Book/Published conference output › Conference publication

TY - GEN

T1 - Mask-less lithography for fabrication of optical waveguides

AU - Dubov, Mykhaylo

AU - Natarajan, S.R.

AU - Williams, John A.R.

AU - Bennion, Ian

N1 - M. Dubov ; S. R. Natarajan ; J. A. R. Williams and I. Bennion "Mask-less lithography for fabrication of optical waveguides", Proc. SPIE 6881, Commercial and Biomedical Applications of Ultrafast Lasers VIII, 688110 (February 15, 2008); doi:10.1117/12.762594. Copyright 2008 Society of Photo-Optical Instrumentation Engineers. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited. http://dx.doi.org/10.1117/12.762594

PY - 2008/2/15

Y1 - 2008/2/15

N2 - A flexible method for fabricating shallow optical waveguides by using femtosecond laser writing of patterns on a metal coated glass substrate followed by ion-exchange is described. This overcomes the drawbacks of low index contrast and high induced stress in waveguides directly written using low-repetition rate ultrafast laser systems. When compared to conventional lithography, the technique is simpler and has advantages in terms of flexibility in the types of structures which can be fabricated.

AB - A flexible method for fabricating shallow optical waveguides by using femtosecond laser writing of patterns on a metal coated glass substrate followed by ion-exchange is described. This overcomes the drawbacks of low index contrast and high induced stress in waveguides directly written using low-repetition rate ultrafast laser systems. When compared to conventional lithography, the technique is simpler and has advantages in terms of flexibility in the types of structures which can be fabricated.

KW - glass

KW - ion exchange

KW - lithography

KW - substrates

KW - ultrashort pulses

KW - femtosecond lithography

KW - mask-less

KW - planar lightwave circuit

UR - http://www.scopus.com/inward/record.url?scp=41149145613&partnerID=8YFLogxK

UR - http://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=821833

U2 - 10.1117/12.762594

DO - 10.1117/12.762594

M3 - Conference publication

SN - 978-0-8194-7056-0

VL - 6881

T3 - SPIE proceedings

SP - 688110

BT - Commercial and biomedical applications of ultrafast lasers VIII

A2 - Neev, Joseph

A2 - Nolte, Stefan

A2 - Heisterkamp, Alexander

A2 - Schaffer, Christopher B.

PB - SPIE

T2 - Commercial and Biomedical Applications of Ultrafast Lasers VIII

Y2 - 20 January 2008 through 23 January 2008

ER -

Mask-less lithography for fabrication of optical waveguides

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Bibliographical note

Keywords

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