A flexible method for fabricating shallow optical waveguides by using femtosecond laser writing of patterns on a metal coated glass substrate followed by ion-exchange is described. This overcomes the drawbacks of low index contrast and high induced stress in waveguides directly written using low-repetition rate ultrafast laser systems. When compared to conventional lithography, the technique is simpler and has advantages in terms of flexibility in the types of structures which can be fabricated.
|Title of host publication||Commercial and biomedical applications of ultrafast lasers VIII|
|Editors||Joseph Neev, Stefan Nolte, Alexander Heisterkamp, Christopher B. Schaffer|
|Publication status||Published - 15 Feb 2008|
|Event||Commercial and Biomedical Applications of Ultrafast Lasers VIII - San Jose, CA, United States|
Duration: 20 Jan 2008 → 23 Jan 2008
|Conference||Commercial and Biomedical Applications of Ultrafast Lasers VIII|
|City||San Jose, CA|
|Period||20/01/08 → 23/01/08|
Bibliographical noteM. Dubov ; S. R. Natarajan ; J. A. R. Williams and I. Bennion
"Mask-less lithography for fabrication of optical waveguides", Proc. SPIE 6881, Commercial and Biomedical Applications of Ultrafast Lasers VIII, 688110 (February 15, 2008); doi:10.1117/12.762594.
Copyright 2008 Society of Photo-Optical Instrumentation Engineers. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.
- ion exchange
- ultrashort pulses
- femtosecond lithography
- planar lightwave circuit