Reduction of internal friction in silica glass with high OH content

Boris Lunin, Kirill Tokmakov

Research output: Contribution to journalArticle

Abstract

The aim of this article is to investigate processes occurring during annealing of silica glass classified as being of type III1. This is an inexpensive silica glass produced by many manufacturers across the globe. However, it can be successfully used for fabrication of high-Q mechanical resonators. The relationship between residual internal stress and internal friction is elucidated. Quantitative analysis of the structural relaxation kinetics is presented. The influence of the cooling process for structural transformation is also discussed. Based on our results, we suggest optimal annealing conditions for minimizing internal friction type III silica glass. The results will be useful for further improvement of the Q-factor of mechanical resonators, including the test masses of the
next generation of gravitational wave detectors. Our approach might, in addition, be used for studying the modification of atomic structure in multicomponent glasses. 
Original languageEnglish
Number of pages32
JournalJournal of the American Ceramic Society
Early online date2 Nov 2018
DOIs
Publication statusE-pub ahead of print - 2 Nov 2018

Bibliographical note

© 2018 The American Ceramic Society. This is the peer reviewed version of the following article: Lunin BS, Tokmakov KV. Reduction in internal friction in silica glass with high OH content. J Am Ceram Soc. 2018;00:1–12, which has been published in final form at https://doi.org/10.1111/jace.16187].  This article may be used for non-commercial purposes in accordance With Wiley Terms and Conditions for self-archiving.

Keywords

  • silica glass, internal friction, annealing, stress

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