Structural, electrical, and multiferroic properties of Aurivillius (Bi7−xLa x)Fe3Ti3O21 thin films

C. M. Raghavan; J. W. Kim; J. Y. Choi; S. S. Kim; J. W. Kim

doi:10.3938/jkps.68.1

Structural, electrical, and multiferroic properties of Aurivillius (Bi_7−xLa_x)Fe₃Ti₃O₂₁ thin films

C. M. Raghavan
, J. W. Kim
, J. Y. Choi
, S. S. Kim^*
, J. W. Kim

^*Corresponding author for this work

Changwon National University

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

The effects of La³⁺- ion doping on the structural, electrical, and multiferroic properties of the six-layered Aurivillius-phase Bi₇Fe₃Ti₃O₂₁ thin film were investigated. A chemical solution deposition method was used to deposit the (Bi_7−xLa_x)Fe₃Ti₃O₂₁ (x = 0 and 0.6) thin films on Pt(111)/Ti/SiO₂/Si(100) substrates. The formation of Aurivillius orthorhombic structures was confirmed by using X-ray diffraction and Raman spectroscopy studies. The (Bi_6.4La_0.6)Fe₃Ti₃O₂₁ thin film exhibited a low leakage current density (1.84 × 10⁻⁶ A/cm² at an applied electric field of 100 kV/cm) and a large remnant polarization (20.20 μC/cm² at an applied electric field of 318 kV/cm) as compared to the Bi₇Fe₃Ti₃O₂₁ thin film. The enhanced electrical and multiferroic properties are ascribed to a reduced oxygen concentration and a structural distortion. Both thin films were weakly ferromagnetic at room temperature.

Original language	English
Pages (from-to)	1-6
Number of pages	6
Journal	Journal of the Korean Physical Society
Volume	68
Issue number	1
DOIs	https://doi.org/10.3938/jkps.68.1
Publication status	Published - 1 Jan 2016

Funding

This work was supported by the Priority Research Centers Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology (2010-0029634).

Keywords

Chemical solution deposition
Electrical properties
La-doped BiFeTiO thin film
Multiferroic properties

Access to Document

10.3938/jkps.68.1

Cite this

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title = "Structural, electrical, and multiferroic properties of Aurivillius (Bi7−xLa x)Fe3Ti3O21 thin films",

abstract = "The effects of La3+- ion doping on the structural, electrical, and multiferroic properties of the six-layered Aurivillius-phase Bi7Fe3Ti3O21 thin film were investigated. A chemical solution deposition method was used to deposit the (Bi7−xLax)Fe3Ti3O21 (x = 0 and 0.6) thin films on Pt(111)/Ti/SiO2/Si(100) substrates. The formation of Aurivillius orthorhombic structures was confirmed by using X-ray diffraction and Raman spectroscopy studies. The (Bi6.4La0.6)Fe3Ti3O21 thin film exhibited a low leakage current density (1.84 × 10−6 A/cm2 at an applied electric field of 100 kV/cm) and a large remnant polarization (20.20 μC/cm2 at an applied electric field of 318 kV/cm) as compared to the Bi7Fe3Ti3O21 thin film. The enhanced electrical and multiferroic properties are ascribed to a reduced oxygen concentration and a structural distortion. Both thin films were weakly ferromagnetic at room temperature.",

keywords = "Chemical solution deposition, Electrical properties, La-doped BiFeTiO thin film, Multiferroic properties",

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AU - Raghavan, C. M.

AU - Kim, J. W.

AU - Choi, J. Y.

AU - Kim, S. S.

AU - Kim, J. W.

PY - 2016/1/1

Y1 - 2016/1/1

N2 - The effects of La3+- ion doping on the structural, electrical, and multiferroic properties of the six-layered Aurivillius-phase Bi7Fe3Ti3O21 thin film were investigated. A chemical solution deposition method was used to deposit the (Bi7−xLax)Fe3Ti3O21 (x = 0 and 0.6) thin films on Pt(111)/Ti/SiO2/Si(100) substrates. The formation of Aurivillius orthorhombic structures was confirmed by using X-ray diffraction and Raman spectroscopy studies. The (Bi6.4La0.6)Fe3Ti3O21 thin film exhibited a low leakage current density (1.84 × 10−6 A/cm2 at an applied electric field of 100 kV/cm) and a large remnant polarization (20.20 μC/cm2 at an applied electric field of 318 kV/cm) as compared to the Bi7Fe3Ti3O21 thin film. The enhanced electrical and multiferroic properties are ascribed to a reduced oxygen concentration and a structural distortion. Both thin films were weakly ferromagnetic at room temperature.

AB - The effects of La3+- ion doping on the structural, electrical, and multiferroic properties of the six-layered Aurivillius-phase Bi7Fe3Ti3O21 thin film were investigated. A chemical solution deposition method was used to deposit the (Bi7−xLax)Fe3Ti3O21 (x = 0 and 0.6) thin films on Pt(111)/Ti/SiO2/Si(100) substrates. The formation of Aurivillius orthorhombic structures was confirmed by using X-ray diffraction and Raman spectroscopy studies. The (Bi6.4La0.6)Fe3Ti3O21 thin film exhibited a low leakage current density (1.84 × 10−6 A/cm2 at an applied electric field of 100 kV/cm) and a large remnant polarization (20.20 μC/cm2 at an applied electric field of 318 kV/cm) as compared to the Bi7Fe3Ti3O21 thin film. The enhanced electrical and multiferroic properties are ascribed to a reduced oxygen concentration and a structural distortion. Both thin films were weakly ferromagnetic at room temperature.

KW - Chemical solution deposition

KW - Electrical properties

KW - La-doped BiFeTiO thin film

KW - Multiferroic properties

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