Sub-critical regime of femtosecond inscription

Sergei K. Turitsyn*, Vladimir Mezentsev, Mykhaylo Dubov, Alexander M. Rubenchik, Michail P. Fedoruk, Evgeny V. Podivilov

*Corresponding author for this work

Research output: Contribution to journalArticle

Abstract

We apply well known nonlinear diffraction theory governing focusing of a powerful light beam of arbitrary shape in medium with Kerr nonlinearity to the analysis of femtosecond (fs) laser processing of dielectric in sub-critical (input power less than the critical power of selffocusing) regime. Simple analytical expressions are derived for the input beam power and spatial focusing parameter (numerical aperture) that are required for achieving an inscription threshold. Application of non-Gaussian laser beams for better controlled fs inscription at higher powers is also discussed. © 2007 Optical Society of America.

Original languageEnglish
Pages (from-to)14750-14764
Number of pages15
JournalOptics Express
Volume15
Issue number22
DOIs
Publication statusPublished - 29 Oct 2007

Bibliographical note

© 2007 Optical Society of America. This paper was published in Optics Express and is made available as an electronic reprint with the permission of OSA. The paper can be found at the following URL on the OSA website: http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-15-22-14750 Systematic or multiple reproduction or distribution to multiple locations via electronic or other means is prohibited and is subject to penalties under law.

Keywords

  • diffraction
  • laser beams
  • numerical methods
  • optical Kerr effect
  • femtosecond inscription
  • Gaussian laser beams

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    Turitsyn, S. K., Mezentsev, V., Dubov, M., Rubenchik, A. M., Fedoruk, M. P., & Podivilov, E. V. (2007). Sub-critical regime of femtosecond inscription. Optics Express, 15(22), 14750-14764. https://doi.org/10.1364/OE.15.014750