Surface roughness reduction and diffraction efficiency optimisation for e-beam written phase masks

Engineering & Materials Science

• Diffraction efficiency 100%
• Diffraction gratings 43%
• Lithography 30%
• Masks 53%
• Reactive ion etching 37%
• Surface roughness 46%

Physics & Astronomy

• diffraction 29%
• etching 21%
• gratings 40%
• ions 13%
• lithography 23%
• masks 47%
• optimization 36%
• roughness 23%
• surface roughness 47%

Chemistry

• Etching 50%
• Ion 22%
• Reduction 25%
• Surface 17%
• Surface Roughness 56%