Synthesis of High χ–Low N Diblock Copolymers by Polymerization-Induced Self-Assembly

James Jennings; Erik J. Cornel; Matthew J. Derry; Deborah L. Beattie; Matthew J. Rymaruk; Oliver J. Deane; Anthony J. Ryan; Steven P. Armes

doi:10.1002/anie.202001436

Synthesis of High χ–Low N Diblock Copolymers by Polymerization-Induced Self-Assembly

James Jennings, Erik J. Cornel, Matthew J. Derry, Deborah L. Beattie, Matthew J. Rymaruk, Oliver J. Deane, Anthony J. Ryan, Steven P. Armes

Research output: Contribution to journal › Article › peer-review

Abstract

Polymerization‐induced self‐assembly (PISA) enables the scalable synthesis of functional block copolymer nanoparticles with various morphologies. Herein we exploit this versatile technique to produce so‐called ‘high χ ‐low N ’ diblock copolymers that undergo nanoscale phase separation in the solid state to produce sub‐10 nm surface features. By varying the degree of polymerization of the stabilizer and core‐forming blocks, PISA provides rapid access to a wide range of diblock copolymers, and enables fundamental thermodynamic parameters to be determined. In addition, the pre‐organization of copolymer chains within sterically‐stabilized nanoparticles that occurs during PISA leads to enhanced phase separation relative to that achieved using solution‐cast molecularly‐dissolved copolymer chains.

Original language	English
Pages (from-to)	10848-10853
Number of pages	6
Journal	Angewandte Chemie
Volume	59
Issue number	27
Early online date	8 Apr 2020
DOIs	https://doi.org/10.1002/anie.202001436
Publication status	Published - 26 Jun 2020

Bibliographical note

© 2020 The Authors. Published by Wiley-VCH Verlag GmbH & Co. KGaA. This is an open access article under the terms of the Creative Commons Attribution License, which permits use, distribution and reproduction in any medium, provided the original work is properly cited.

Funding: Engineering and Physical Sciences Research Council. Grant Number: EP/R003009/1; European Research Council. Grant Number: PISA320372

Keywords

block copolymers
nanolithography
nanoparticle processing
polymerization-induced self-assembly
solid-state morphology

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10.1002/anie.202001436Licence: CC BY 3.0

Synthesis of High χ ‐ Low N Diblock CopolymersAccepted author manuscript, 1.17 MBLicence: CC BY 3.0
Synthesis of High χ –Low N Diblock Copolymers by Polymerization‐Induced Self‐Assembly
© 2020 The Authors. Published by Wiley-VCH Verlag GmbH & Co. KGaA. This is an open access article under the terms of the Creative Commons Attribution License, which permits use, distribution and reproduction in any medium, provided the original work is properly cited.
Final published version, 1.6 MBLicence: CC BY 3.0

Cite this

@article{ea67491b40c44e41a53828ca9171eedf,

title = "Synthesis of High χ–Low N Diblock Copolymers by Polymerization-Induced Self-Assembly",

abstract = "Polymerization‐induced self‐assembly (PISA) enables the scalable synthesis of functional block copolymer nanoparticles with various morphologies. Herein we exploit this versatile technique to produce so‐called {\textquoteleft}high χ ‐low N {\textquoteright} diblock copolymers that undergo nanoscale phase separation in the solid state to produce sub‐10 nm surface features. By varying the degree of polymerization of the stabilizer and core‐forming blocks, PISA provides rapid access to a wide range of diblock copolymers, and enables fundamental thermodynamic parameters to be determined. In addition, the pre‐organization of copolymer chains within sterically‐stabilized nanoparticles that occurs during PISA leads to enhanced phase separation relative to that achieved using solution‐cast molecularly‐dissolved copolymer chains.",

keywords = "block copolymers, nanolithography, nanoparticle processing, polymerization-induced self-assembly, solid-state morphology",

author = "James Jennings and Cornel, {Erik J.} and Derry, {Matthew J.} and Beattie, {Deborah L.} and Rymaruk, {Matthew J.} and Deane, {Oliver J.} and Ryan, {Anthony J.} and Armes, {Steven P.}",

note = "{\textcopyright} 2020 The Authors. Published by Wiley-VCH Verlag GmbH & Co. KGaA. This is an open access article under the terms of the Creative Commons Attribution License, which permits use, distribution and reproduction in any medium, provided the original work is properly cited. Funding: Engineering and Physical Sciences Research Council. Grant Number: EP/R003009/1; European Research Council. Grant Number: PISA320372",

year = "2020",

month = jun,

day = "26",

doi = "10.1002/anie.202001436",

language = "English",

volume = "59",

pages = "10848--10853",

journal = "Angewandte Chemie",

issn = "1433-7851",

publisher = "Wiley",

number = "27",

}

TY - JOUR

T1 - Synthesis of High χ–Low N Diblock Copolymers by Polymerization-Induced Self-Assembly

AU - Jennings, James

AU - Cornel, Erik J.

AU - Derry, Matthew J.

AU - Beattie, Deborah L.

AU - Rymaruk, Matthew J.

AU - Deane, Oliver J.

AU - Ryan, Anthony J.

AU - Armes, Steven P.

N1 - © 2020 The Authors. Published by Wiley-VCH Verlag GmbH & Co. KGaA. This is an open access article under the terms of the Creative Commons Attribution License, which permits use, distribution and reproduction in any medium, provided the original work is properly cited. Funding: Engineering and Physical Sciences Research Council. Grant Number: EP/R003009/1; European Research Council. Grant Number: PISA320372

PY - 2020/6/26

Y1 - 2020/6/26

N2 - Polymerization‐induced self‐assembly (PISA) enables the scalable synthesis of functional block copolymer nanoparticles with various morphologies. Herein we exploit this versatile technique to produce so‐called ‘high χ ‐low N ’ diblock copolymers that undergo nanoscale phase separation in the solid state to produce sub‐10 nm surface features. By varying the degree of polymerization of the stabilizer and core‐forming blocks, PISA provides rapid access to a wide range of diblock copolymers, and enables fundamental thermodynamic parameters to be determined. In addition, the pre‐organization of copolymer chains within sterically‐stabilized nanoparticles that occurs during PISA leads to enhanced phase separation relative to that achieved using solution‐cast molecularly‐dissolved copolymer chains.

AB - Polymerization‐induced self‐assembly (PISA) enables the scalable synthesis of functional block copolymer nanoparticles with various morphologies. Herein we exploit this versatile technique to produce so‐called ‘high χ ‐low N ’ diblock copolymers that undergo nanoscale phase separation in the solid state to produce sub‐10 nm surface features. By varying the degree of polymerization of the stabilizer and core‐forming blocks, PISA provides rapid access to a wide range of diblock copolymers, and enables fundamental thermodynamic parameters to be determined. In addition, the pre‐organization of copolymer chains within sterically‐stabilized nanoparticles that occurs during PISA leads to enhanced phase separation relative to that achieved using solution‐cast molecularly‐dissolved copolymer chains.

KW - block copolymers

KW - nanolithography

KW - nanoparticle processing

KW - polymerization-induced self-assembly

KW - solid-state morphology

UR - http://doi.wiley.com/10.1002/anie.202001436

UR - http://www.scopus.com/inward/record.url?scp=85085128409&partnerID=8YFLogxK

U2 - 10.1002/anie.202001436

DO - 10.1002/anie.202001436

M3 - Article

C2 - 32267055

SN - 1433-7851

VL - 59

SP - 10848

EP - 10853

JO - Angewandte Chemie

JF - Angewandte Chemie

IS - 27

ER -

Synthesis of High χ–Low N Diblock Copolymers by Polymerization-Induced Self-Assembly

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