Thermal re-emission model

Amit K. Chattopadhyay

doi:10.1103/PhysRevB.65.041405

Thermal re-emission model

Amit K. Chattopadhyay

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Abstract

Starting from a continuum description, we study the nonequilibrium roughening of a thermal re-emission model for etching in one and two spatial dimensions. Using standard analytical techniques, we map our problem to a generalized version of an earlier nonlocal KPZ (Kardar-Parisi-Zhang) model. In 2 + 1 dimensions, the values of the roughness and the dynamic exponents calculated from our theory go like α ≈ z ≈ 1 and in 1 + 1 dimensions, the exponents resemble the KPZ values for low vapor pressure, supporting experimental results. Interestingly, Galilean invariance is maintained throughout.

Original language	English
Article number	41405
Number of pages	4
Journal	Physical Review B
Volume	65
Issue number	4
DOIs	https://doi.org/10.1103/PhysRevB.65.041405
Publication status	Published - 4 Jan 2002

Bibliographical note

Keywords

analytic method
article
mathematical analysis
molecular dynamics
molecular physics
nonbiological model
theory
vapor pressure

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10.1103/PhysRevB.65.041405

Thermal re-emission mode
©2002 American Physical Society
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AB - Starting from a continuum description, we study the nonequilibrium roughening of a thermal re-emission model for etching in one and two spatial dimensions. Using standard analytical techniques, we map our problem to a generalized version of an earlier nonlocal KPZ (Kardar-Parisi-Zhang) model. In 2 + 1 dimensions, the values of the roughness and the dynamic exponents calculated from our theory go like α ≈ z ≈ 1 and in 1 + 1 dimensions, the exponents resemble the KPZ values for low vapor pressure, supporting experimental results. Interestingly, Galilean invariance is maintained throughout.

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Thermal re-emission model

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