Thin films in the presence of chemical reactions

Antonio Pereira; Serafim Kalliadasis; Philip Trevelyan; Uwe Thiele

doi:10.3970/fdmp.2007.003.303

Thin films in the presence of chemical reactions

Antonio Pereira, Serafim Kalliadasis, Philip Trevelyan, Uwe Thiele

College of Engineering and Physical Sciences

Imperial College London

Research output: Contribution to journal › Article

3 Citations (Scopus)

Abstract

We investigate the interaction between thin films and chemical reactions by using two prototype systems: a thin liquid film falling down a planar inclined substrate in the presence of an exothermic chemical reaction and a horizontal thin liquid film with a reactive mixture of insoluble surfactants on its surface. In the first case the chemical reaction has a stabilizing influence on the dynamics of the film and dampens the free-surface solitary pulses. In the second case the chemical reaction can destabilize the film and lead to the formation of free-surface solitary pulses.

Original language	English
Pages (from-to)	303-316
Number of pages	13
Journal	Fluid Dynamics and Materials Processing
Volume	3
Issue number	4
DOIs	https://doi.org/10.3970/fdmp.2007.003.303
Publication status	E-pub ahead of print - 31 Dec 2007

Bibliographical note

Copyright © 2007. This work is licensed under a Creative Commons Attribution 4.0 International License https://creativecommons.org/licenses/by/4.0/, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Keywords

Thin films
chemical reactions
thermal/solutal marangoni effect

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10.3970/fdmp.2007.003.303

https://file.techscience.com/files/fdmp/2007/v3n4/fdmp.2007.003.303.pdf

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abstract = "We investigate the interaction between thin films and chemical reactions by using two prototype systems: a thin liquid film falling down a planar inclined substrate in the presence of an exothermic chemical reaction and a horizontal thin liquid film with a reactive mixture of insoluble surfactants on its surface. In the first case the chemical reaction has a stabilizing influence on the dynamics of the film and dampens the free-surface solitary pulses. In the second case the chemical reaction can destabilize the film and lead to the formation of free-surface solitary pulses.",

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AU - Pereira, Antonio

AU - Kalliadasis, Serafim

AU - Trevelyan, Philip

AU - Thiele, Uwe

N1 - Copyright © 2007. This work is licensed under a Creative Commons Attribution 4.0 International License https://creativecommons.org/licenses/by/4.0/, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

PY - 2007/12/31

Y1 - 2007/12/31

N2 - We investigate the interaction between thin films and chemical reactions by using two prototype systems: a thin liquid film falling down a planar inclined substrate in the presence of an exothermic chemical reaction and a horizontal thin liquid film with a reactive mixture of insoluble surfactants on its surface. In the first case the chemical reaction has a stabilizing influence on the dynamics of the film and dampens the free-surface solitary pulses. In the second case the chemical reaction can destabilize the film and lead to the formation of free-surface solitary pulses.

AB - We investigate the interaction between thin films and chemical reactions by using two prototype systems: a thin liquid film falling down a planar inclined substrate in the presence of an exothermic chemical reaction and a horizontal thin liquid film with a reactive mixture of insoluble surfactants on its surface. In the first case the chemical reaction has a stabilizing influence on the dynamics of the film and dampens the free-surface solitary pulses. In the second case the chemical reaction can destabilize the film and lead to the formation of free-surface solitary pulses.

KW - Thin films

KW - chemical reactions

KW - thermal/solutal marangoni effect

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SP - 303

EP - 316

JO - Fluid Dynamics and Materials Processing

JF - Fluid Dynamics and Materials Processing

IS - 4

ER -

Thin films in the presence of chemical reactions

Abstract

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Keywords

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