Electroless Nickel Deposition: An Alternative for Graphene Contacting

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Abstract

We report the first investigation into the potential of electroless nickel deposition to form ohmic contacts on single layer graphene. To minimize the contact resistance on graphene, a statistical model was used to improve metal purity, surface roughness, and coverage of the deposited film by controlling the nickel bath parameters (pH and temperature). The metalized graphene layers were patterned using photolithography and contacts deposited at temperatures as low as 60 °C. The contact resistance was 215 ± 23 ω over a contact area of 200 μm × 200 μm, which improved upon rapid annealing to 107 ± 9 ω. This method shows promise toward low-cost and large-scale graphene integration into functional devices such as flexible sensors and printed electronics.

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Original languageEnglish
Pages (from-to)31359-31367
Number of pages9
JournalACS Applied Materials and Interfaces
Volume8
Issue number45
DOIs
Publication statusPublished - 21 Oct 2016

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This is an open access article published under a Creative Commons Attribution (CC-BY) License, which permits unrestricted use, distribution and reproduction in any medium, provided the author and source are cited.

    Keywords

  • contact resistance, contacting graphene, electroless nickel, interface characterization, transmission line method

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