Point-by-point inscription of 250 nm period structure in bulk fused silica by tightly focused femtosecond UV pulses

Mykhaylo Dubov; Ian Bennion; David N. Nikogosyan; P. Bolger; A.V. Zayats

doi:10.1088/1464-4258/10/2/025305

Point-by-point inscription of 250 nm period structure in bulk fused silica by tightly focused femtosecond UV pulses

Mykhaylo Dubov, Ian Bennion, David N. Nikogosyan, P. Bolger, A.V. Zayats

Aston Institute of Photonic Technologies (AiPT)

Research output: Contribution to journal › Article › peer-review

Abstract

By conducting point-by-point inscription in a continuously moving slab of pure fused silica at the optimal depth (170&nu;m depth below the surface), we have fabricated a 250nm period nanostructure with 30nJ, 300fs, 1kHz pulses from a frequency-tripled Ti:sapphire laser. This is the smallest value for the inscribed period yet reported, and has been achieved with radical improvement in the quality of the inscribed nanostructures in comparison with previous reports.

Original language	English
Article number	025305
Pages (from-to)	025305
Number of pages	1
Journal	Journal of Optics A
Volume	10
Issue number	2
DOIs	https://doi.org/10.1088/1464-4258/10/2/025305
Publication status	Published - 6 Feb 2008

Keywords

atomic force microscopy
fused silica
microfabrication
nanostructures
sapphire
differential interference contrast microscopy
sapphire lasers

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10.1088/1464-4258/10/2/025305

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title = "Point-by-point inscription of 250 nm period structure in bulk fused silica by tightly focused femtosecond UV pulses",

abstract = "By conducting point-by-point inscription in a continuously moving slab of pure fused silica at the optimal depth (170νm depth below the surface), we have fabricated a 250nm period nanostructure with 30nJ, 300fs, 1kHz pulses from a frequency-tripled Ti:sapphire laser. This is the smallest value for the inscribed period yet reported, and has been achieved with radical improvement in the quality of the inscribed nanostructures in comparison with previous reports.",

keywords = "atomic force microscopy, fused silica, microfabrication, nanostructures, sapphire, differential interference contrast microscopy, sapphire lasers",

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AU - Dubov, Mykhaylo

AU - Bennion, Ian

AU - Nikogosyan, David N.

AU - Bolger, P.

AU - Zayats, A.V.

PY - 2008/2/6

Y1 - 2008/2/6

N2 - By conducting point-by-point inscription in a continuously moving slab of pure fused silica at the optimal depth (170νm depth below the surface), we have fabricated a 250nm period nanostructure with 30nJ, 300fs, 1kHz pulses from a frequency-tripled Ti:sapphire laser. This is the smallest value for the inscribed period yet reported, and has been achieved with radical improvement in the quality of the inscribed nanostructures in comparison with previous reports.

AB - By conducting point-by-point inscription in a continuously moving slab of pure fused silica at the optimal depth (170νm depth below the surface), we have fabricated a 250nm period nanostructure with 30nJ, 300fs, 1kHz pulses from a frequency-tripled Ti:sapphire laser. This is the smallest value for the inscribed period yet reported, and has been achieved with radical improvement in the quality of the inscribed nanostructures in comparison with previous reports.

KW - atomic force microscopy

KW - fused silica

KW - microfabrication

KW - nanostructures

KW - sapphire

KW - differential interference contrast microscopy

KW - sapphire lasers

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JF - Journal of Optics A

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ER -

Point-by-point inscription of 250 nm period structure in bulk fused silica by tightly focused femtosecond UV pulses

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