Abstract
Starting from a continuum description, we study the nonequilibrium roughening of a thermal re-emission model for etching in one and two spatial dimensions. Using standard analytical techniques, we map our problem to a generalized version of an earlier nonlocal KPZ (Kardar-Parisi-Zhang) model. In 2 + 1 dimensions, the values of the roughness and the dynamic exponents calculated from our theory go like α ≈ z ≈ 1 and in 1 + 1 dimensions, the exponents resemble the KPZ values for low vapor pressure, supporting experimental results. Interestingly, Galilean invariance is maintained throughout.
Original language | English |
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Article number | 41405 |
Number of pages | 4 |
Journal | Physical Review B |
Volume | 65 |
Issue number | 4 |
DOIs | |
Publication status | Published - 4 Jan 2002 |
Bibliographical note
©2002 American Physical SocietyKeywords
- analytic method
- article
- mathematical analysis
- molecular dynamics
- molecular physics
- nonbiological model
- theory
- vapor pressure