Argon rf plasma treatment of PET films for silicon films adhesion improvement

I. A. Rusu*, G. Popa, S. O. Saied, J. L. Sullivan

*Corresponding author for this work

Research output: Contribution to journalArticle

Abstract

The main aim of this studies was to find the most effective methods to improve the adhesion between thin silicon films and polymer surfaces. The PET films surface modifications induced by treatments in argon rf discharge were investigated using XPS analysis, contact angle method and AFM analysis. An rf magnetron system was used to deposit the thin Si layer on PET samples. The peel-load test offered quantitative information related to the adhesion between silicon layer and polymer surfaces.

Original languageEnglish
Pages (from-to)2529-2534
Number of pages6
JournalJournal of Optoelectronics and Advanced Materials
Volume7
Issue number5
Publication statusPublished - 1 Oct 2005

Keywords

  • Adhesion
  • PET films
  • RF plasma
  • Silicon film

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