Argon rf plasma treatment of PET films for silicon films adhesion improvement

I. A. Rusu; G. Popa; S. O. Saied; J. L. Sullivan

Argon rf plasma treatment of PET films for silicon films adhesion improvement

I. A. Rusu^*, G. Popa, S. O. Saied, J. L. Sullivan

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

Abstract

The main aim of this studies was to find the most effective methods to improve the adhesion between thin silicon films and polymer surfaces. The PET films surface modifications induced by treatments in argon rf discharge were investigated using XPS analysis, contact angle method and AFM analysis. An rf magnetron system was used to deposit the thin Si layer on PET samples. The peel-load test offered quantitative information related to the adhesion between silicon layer and polymer surfaces.

Original language	English
Pages (from-to)	2529-2534
Number of pages	6
Journal	Journal of Optoelectronics and Advanced Materials
Volume	7
Issue number	5
Publication status	Published - 1 Oct 2005

Keywords

Adhesion
PET films
RF plasma
Silicon film

Cite this

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title = "Argon rf plasma treatment of PET films for silicon films adhesion improvement",

abstract = "The main aim of this studies was to find the most effective methods to improve the adhesion between thin silicon films and polymer surfaces. The PET films surface modifications induced by treatments in argon rf discharge were investigated using XPS analysis, contact angle method and AFM analysis. An rf magnetron system was used to deposit the thin Si layer on PET samples. The peel-load test offered quantitative information related to the adhesion between silicon layer and polymer surfaces.",

keywords = "Adhesion, PET films, RF plasma, Silicon film",

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year = "2005",

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T1 - Argon rf plasma treatment of PET films for silicon films adhesion improvement

AU - Rusu, I. A.

AU - Popa, G.

AU - Saied, S. O.

AU - Sullivan, J. L.

PY - 2005/10/1

Y1 - 2005/10/1

N2 - The main aim of this studies was to find the most effective methods to improve the adhesion between thin silicon films and polymer surfaces. The PET films surface modifications induced by treatments in argon rf discharge were investigated using XPS analysis, contact angle method and AFM analysis. An rf magnetron system was used to deposit the thin Si layer on PET samples. The peel-load test offered quantitative information related to the adhesion between silicon layer and polymer surfaces.

AB - The main aim of this studies was to find the most effective methods to improve the adhesion between thin silicon films and polymer surfaces. The PET films surface modifications induced by treatments in argon rf discharge were investigated using XPS analysis, contact angle method and AFM analysis. An rf magnetron system was used to deposit the thin Si layer on PET samples. The peel-load test offered quantitative information related to the adhesion between silicon layer and polymer surfaces.

KW - Adhesion

KW - PET films

KW - RF plasma

KW - Silicon film

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M3 - Article

AN - SCOPUS:27844515114

SN - 1454-4164

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JO - Journal of Optoelectronics and Advanced Materials

JF - Journal of Optoelectronics and Advanced Materials

IS - 5

ER -

Argon rf plasma treatment of PET films for silicon films adhesion improvement

Abstract

Keywords

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