Demonstration of inscription and ablation of phase masks for the production of 1st, 2nd and 3rd order FBG gratings using a femtosecond laser

Graham N. Smith, Kyriacos Kalli, Ian Bennion, Kate Sugden

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We present to the best of our knowledge the first example of femtosecond laser inscription/ablation of phase/amplitude masks for the demonstrated purpose of inscribing Bragg gratings in optical fibers. We show that the utilization of a femtosecond laser for the mask production allows for great flexibility in controlling the mask period. The masks are used to produce 1st, 2nd and 3rd order fiber Bragg gratings (FBGs) in SMF-28. The work demonstrates the proof of concept and flexibility for the use of femtosecond lasers for the rapid prototyping of complex and reproducible mask structures. Our inscription studies are augmented by considerations of three-beam interference effects that occur as a result of the strong zeroth-order component that is present in addition to higher-order diffraction components.

Original languageEnglish
Title of host publicationAdvanced Fabrication Technologies for Micro/Nano Optics and Photonics II
EditorsThomas J. Suleski, Winston V. Schoenfeld, Jian Jim Wang
Place of PublicationBellingham, WA (US)
PublisherSPIE
Number of pages11
ISBN (Print)978-0-81947-451-3
DOIs
Publication statusPublished - 24 Feb 2009

Publication series

NameSPIE Proceedings
PublisherSPIE
Volume7205
ISSN (Print)0277-786X
ISSN (Electronic)2410-9045

Fingerprint

Femtosecond Laser
Ablation
Diffraction gratings
Fiber Grating
Fiber Bragg gratings
Bragg Grating
Ultrashort pulses
Gratings
Bragg gratings
ablation
Mask
Masks
Demonstrations
masks
gratings
fibers
lasers
flexibility
Flexibility
Order Component

Bibliographical note

Graham N. Smith ; Kyriacos Kalli ; Ian Bennion and Kate Sugden
"Demonstration of inscription and ablation of phase masks for the production of 1st, 2nd, and 3rd order FBG gratings using a femtosecond laser", Proc. SPIE 7205, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics II, 720511 (February 24, 2009).

Copyright 2009 Society of Photo-Optical Instrumentation Engineers. One print or electronic copy may be made for personal use only. Systematic electronic or print reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.

DOI: http://dx.doi.org/10.1117/12.809175

Keywords

  • femtosecond laser
  • fiber Bragg gratings
  • inscription
  • laser-material interaction
  • phase masks
  • Talbot effect

Cite this

Smith, G. N., Kalli, K., Bennion, I., & Sugden, K. (2009). Demonstration of inscription and ablation of phase masks for the production of 1st, 2nd and 3rd order FBG gratings using a femtosecond laser. In T. J. Suleski, W. V. Schoenfeld, & J. J. Wang (Eds.), Advanced Fabrication Technologies for Micro/Nano Optics and Photonics II [720511] (SPIE Proceedings; Vol. 7205). Bellingham, WA (US): SPIE. https://doi.org/10.1117/12.809175
Smith, Graham N. ; Kalli, Kyriacos ; Bennion, Ian ; Sugden, Kate. / Demonstration of inscription and ablation of phase masks for the production of 1st, 2nd and 3rd order FBG gratings using a femtosecond laser. Advanced Fabrication Technologies for Micro/Nano Optics and Photonics II. editor / Thomas J. Suleski ; Winston V. Schoenfeld ; Jian Jim Wang. Bellingham, WA (US) : SPIE, 2009. (SPIE Proceedings).
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Smith, GN, Kalli, K, Bennion, I & Sugden, K 2009, Demonstration of inscription and ablation of phase masks for the production of 1st, 2nd and 3rd order FBG gratings using a femtosecond laser. in TJ Suleski, WV Schoenfeld & JJ Wang (eds), Advanced Fabrication Technologies for Micro/Nano Optics and Photonics II., 720511, SPIE Proceedings, vol. 7205, SPIE, Bellingham, WA (US). https://doi.org/10.1117/12.809175

Demonstration of inscription and ablation of phase masks for the production of 1st, 2nd and 3rd order FBG gratings using a femtosecond laser. / Smith, Graham N.; Kalli, Kyriacos; Bennion, Ian; Sugden, Kate.

Advanced Fabrication Technologies for Micro/Nano Optics and Photonics II. ed. / Thomas J. Suleski; Winston V. Schoenfeld; Jian Jim Wang. Bellingham, WA (US) : SPIE, 2009. 720511 (SPIE Proceedings; Vol. 7205).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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N2 - We present to the best of our knowledge the first example of femtosecond laser inscription/ablation of phase/amplitude masks for the demonstrated purpose of inscribing Bragg gratings in optical fibers. We show that the utilization of a femtosecond laser for the mask production allows for great flexibility in controlling the mask period. The masks are used to produce 1st, 2nd and 3rd order fiber Bragg gratings (FBGs) in SMF-28. The work demonstrates the proof of concept and flexibility for the use of femtosecond lasers for the rapid prototyping of complex and reproducible mask structures. Our inscription studies are augmented by considerations of three-beam interference effects that occur as a result of the strong zeroth-order component that is present in addition to higher-order diffraction components.

AB - We present to the best of our knowledge the first example of femtosecond laser inscription/ablation of phase/amplitude masks for the demonstrated purpose of inscribing Bragg gratings in optical fibers. We show that the utilization of a femtosecond laser for the mask production allows for great flexibility in controlling the mask period. The masks are used to produce 1st, 2nd and 3rd order fiber Bragg gratings (FBGs) in SMF-28. The work demonstrates the proof of concept and flexibility for the use of femtosecond lasers for the rapid prototyping of complex and reproducible mask structures. Our inscription studies are augmented by considerations of three-beam interference effects that occur as a result of the strong zeroth-order component that is present in addition to higher-order diffraction components.

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Smith GN, Kalli K, Bennion I, Sugden K. Demonstration of inscription and ablation of phase masks for the production of 1st, 2nd and 3rd order FBG gratings using a femtosecond laser. In Suleski TJ, Schoenfeld WV, Wang JJ, editors, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics II. Bellingham, WA (US): SPIE. 2009. 720511. (SPIE Proceedings). https://doi.org/10.1117/12.809175