Nanopatterned UV curable hydrogels for biomedical applications

Ainhoa Gaston, Ali Z. Khokhar, Leire Bilbao, Virginia Sáez-Martínez, Ana Corres, Isabel Obieta, Nikolaj Gadegaard

Research output: Contribution to journalArticlepeer-review


With an increasing use of emerging patterning technologies such as UV-NIL in biotechnological applications there is at the same time a raising demand for new material for such applications. Here we present a PEG based precursor mixed with a photoinitiator to make it UV sensitive as a new material aimed at biotechnological applications. Using HSQ patterned quartz stamps we observed excellent pattern replication indicating good flow properties of the resist. We were able to obtain imprints with <20 nm residual layer. The PEG based resist has hydrogel properties and it swelling in water was observed by AFM.
Original languageEnglish
Pages (from-to)1057-1061
Number of pages5
JournalMicroelectronic Engineering
Issue number5-8
Publication statusPublished - May 2010


  • UV-NIL
  • flash imprint
  • HSQ
  • PEG


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