Nanopatterned UV curable hydrogels for biomedical applications

Ainhoa Gaston; Ali Z. Khokhar; Leire Bilbao; Virginia Sáez-Martínez; Ana Corres; Isabel Obieta; Nikolaj Gadegaard

doi:10.1016/j.mee.2009.11.089

Nanopatterned UV curable hydrogels for biomedical applications

Ainhoa Gaston, Ali Z. Khokhar, Leire Bilbao, Virginia Sáez-Martínez, Ana Corres, Isabel Obieta, Nikolaj Gadegaard

Chemical Engineering & Applied Chemistry

Research output: Contribution to journal › Article › peer-review

Abstract

With an increasing use of emerging patterning technologies such as UV-NIL in biotechnological applications there is at the same time a raising demand for new material for such applications. Here we present a PEG based precursor mixed with a photoinitiator to make it UV sensitive as a new material aimed at biotechnological applications. Using HSQ patterned quartz stamps we observed excellent pattern replication indicating good flow properties of the resist. We were able to obtain imprints with <20 nm residual layer. The PEG based resist has hydrogel properties and it swelling in water was observed by AFM.

Original language	English
Pages (from-to)	1057-1061
Number of pages	5
Journal	Microelectronic Engineering
Volume	87
Issue number	5-8
DOIs	https://doi.org/10.1016/j.mee.2009.11.089
Publication status	Published - May 2010

Keywords

UV-NIL
flash imprint
HSQ
PEG

Access to Document

10.1016/j.mee.2009.11.089

Cite this

@article{e95bc616b06344f8ae2fe7d676c2240b,

title = "Nanopatterned UV curable hydrogels for biomedical applications",

abstract = "With an increasing use of emerging patterning technologies such as UV-NIL in biotechnological applications there is at the same time a raising demand for new material for such applications. Here we present a PEG based precursor mixed with a photoinitiator to make it UV sensitive as a new material aimed at biotechnological applications. Using HSQ patterned quartz stamps we observed excellent pattern replication indicating good flow properties of the resist. We were able to obtain imprints with <20 nm residual layer. The PEG based resist has hydrogel properties and it swelling in water was observed by AFM.",

keywords = "UV-NIL, flash imprint, HSQ, PEG",

author = "Ainhoa Gaston and Khokhar, {Ali Z.} and Leire Bilbao and Virginia S{\'a}ez-Mart{\'i}nez and Ana Corres and Isabel Obieta and Nikolaj Gadegaard",

year = "2010",

month = may,

doi = "10.1016/j.mee.2009.11.089",

language = "English",

volume = "87",

pages = "1057--1061",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier",

number = "5-8",

}

TY - JOUR

T1 - Nanopatterned UV curable hydrogels for biomedical applications

AU - Gaston, Ainhoa

AU - Khokhar, Ali Z.

AU - Bilbao, Leire

AU - Sáez-Martínez, Virginia

AU - Corres, Ana

AU - Obieta, Isabel

AU - Gadegaard, Nikolaj

PY - 2010/5

Y1 - 2010/5

N2 - With an increasing use of emerging patterning technologies such as UV-NIL in biotechnological applications there is at the same time a raising demand for new material for such applications. Here we present a PEG based precursor mixed with a photoinitiator to make it UV sensitive as a new material aimed at biotechnological applications. Using HSQ patterned quartz stamps we observed excellent pattern replication indicating good flow properties of the resist. We were able to obtain imprints with <20 nm residual layer. The PEG based resist has hydrogel properties and it swelling in water was observed by AFM.

AB - With an increasing use of emerging patterning technologies such as UV-NIL in biotechnological applications there is at the same time a raising demand for new material for such applications. Here we present a PEG based precursor mixed with a photoinitiator to make it UV sensitive as a new material aimed at biotechnological applications. Using HSQ patterned quartz stamps we observed excellent pattern replication indicating good flow properties of the resist. We were able to obtain imprints with <20 nm residual layer. The PEG based resist has hydrogel properties and it swelling in water was observed by AFM.

KW - UV-NIL

KW - flash imprint

KW - HSQ

KW - PEG

UR - https://www.sciencedirect.com/science/article/pii/S0167931709007539?via%3Dihub

U2 - 10.1016/j.mee.2009.11.089

DO - 10.1016/j.mee.2009.11.089

M3 - Article

SN - 0167-9317

VL - 87

SP - 1057

EP - 1061

JO - Microelectronic Engineering

JF - Microelectronic Engineering

IS - 5-8

ER -

Nanopatterned UV curable hydrogels for biomedical applications

Abstract

Keywords

Access to Document

Other files and links

Fingerprint

Cite this