Photosensitivity mechanism of undoped poly(methyl methacrylate) under UV radiation at 325 nm and its spatial resolution limit

D. Sáez Rodríguez*, K. Nielsen, O. Bang, D.J. Webb

*Corresponding author for this work

Research output: Contribution to journalArticle

Abstract

In this Letter, we provide evidence suggesting that the main photosensitive mechanism of an undoped poly(methyl methacrylate)-based microstructured optical fiber under UV radiation at 325 nm is a competitive process of both photodegradation and polymerization. We found experimentally that increasing strain during photo-inscription leads to an increased photosensitivity, which is evidence of photodegradation. Likewise, refractive index change in the fiber was measured to be positive, which provides evidence for further polymerization of the material. Finally, we relate the data obtained to the spatial recording resolution of the samples. © 2014 Optical Society of America.

Original languageEnglish
Pages (from-to)3421-3424
Number of pages4
JournalOptics Letters
Volume39
Issue number12
Early online date4 Jun 2014
DOIs
Publication statusPublished - 15 Jun 2014

Keywords

  • gratings
  • fiber optics
  • fiber Bragg gratings
  • microstructured fibers
  • photonic crystal fibers
  • photonic crystals
  • photosensitivity

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