By conducting point-by-point inscription in a continuously moving slab of a pure fused silica at the optimal depth (170 Î¼m depth below the surface), we have fabricated a 250-nm-period nanostructure with 30 nJ, 300 fs, 1 kHz pulses from frequency-tripled Ti:sapphire laser. This is the smallest value for the inscribed period yet reported, and has been achieved with radical improvement in the quality of the inscribed nanostructures in comparison with previous reports. The performed numerical modeling confirms the obtained experimental results.
Bibliographical noteThe original publication is available at www.springerlink.com © Versita Warsaw and Springer-Verlag Berlin Heidelberg.
- femtosecond UV laser
- fused silica