Abstract
The aim of this article is to study the nature of the defects arising on the surface of silica glass during mechanical processing followed by chemical cleaning and etching. Such defects manifest themselves as a narrow Raman peak near 85 cm –1. It is shown that chemical etching of the ground surface of silica glass leads to the formation of microcrystalline defects embedded at the depth of the near-surface layer. Defects of this kind create heterogeneities in the structure of the atomic network and increase internal friction in silica glass mechanical resonators. This phenomenon should be taken into account when developing the technology for fabrication of high-Q resonators.
| Original language | English |
|---|---|
| Pages (from-to) | 655-663 |
| Journal | International Journal of Applied Glass Science |
| Volume | 13 |
| Issue number | 4 |
| Early online date | 9 Feb 2022 |
| DOIs | |
| Publication status | Published - Oct 2022 |
Bibliographical note
© 2022 The Authors. International Journal of Applied Glass Science published by American Ceramics Society and Wiley Periodicals LLC.This is an open access article under the terms of the Creative Commons Attribution License, which permits use, distribution and reproduction in any medium, provided the original work is properly cited.
Funding: Royal Society (GrantNumber(s): IE160125); Russian Foundation for Basic Research (GrantNumber(s): 16-52-10069)
Keywords
- H8Si8O12
- chemical etching
- grinding
- silica glass
- surface