Thermal re-emission model

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    Starting from a continuum description, we study the nonequilibrium roughening of a thermal re-emission model for etching in one and two spatial dimensions. Using standard analytical techniques, we map our problem to a generalized version of an earlier nonlocal KPZ (Kardar-Parisi-Zhang) model. In 2 + 1 dimensions, the values of the roughness and the dynamic exponents calculated from our theory go like α ≈ z ≈ 1 and in 1 + 1 dimensions, the exponents resemble the KPZ values for low vapor pressure, supporting experimental results. Interestingly, Galilean invariance is maintained throughout.
    Original languageEnglish
    Article number41405
    Number of pages4
    JournalPhysical Review B
    Issue number4
    Publication statusPublished - 4 Jan 2002

    Bibliographical note

    ©2002 American Physical Society


    • analytic method
    • article
    • mathematical analysis
    • molecular dynamics
    • molecular physics
    • nonbiological model
    • theory
    • vapor pressure


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