Thermal re-emission model

Research output: Contribution to journalArticle

Abstract

Starting from a continuum description, we study the nonequilibrium roughening of a thermal re-emission model for etching in one and two spatial dimensions. Using standard analytical techniques, we map our problem to a generalized version of an earlier nonlocal KPZ (Kardar-Parisi-Zhang) model. In 2 + 1 dimensions, the values of the roughness and the dynamic exponents calculated from our theory go like α ≈ z ≈ 1 and in 1 + 1 dimensions, the exponents resemble the KPZ values for low vapor pressure, supporting experimental results. Interestingly, Galilean invariance is maintained throughout.
Original languageEnglish
Article number41405
Number of pages4
JournalPhysical Review B
Volume65
Issue number4
DOIs
Publication statusPublished - 4 Jan 2002

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Invariance
Vapor pressure
exponents
Etching
Surface roughness
vapor pressure
invariance
roughness
low pressure
etching
continuums
Hot Temperature

Bibliographical note

©2002 American Physical Society

Keywords

  • analytic method
  • article
  • mathematical analysis
  • molecular dynamics
  • molecular physics
  • nonbiological model
  • theory
  • vapor pressure

Cite this

@article{c9ca599e262041bc8d35f3b422c21558,
title = "Thermal re-emission model",
abstract = "Starting from a continuum description, we study the nonequilibrium roughening of a thermal re-emission model for etching in one and two spatial dimensions. Using standard analytical techniques, we map our problem to a generalized version of an earlier nonlocal KPZ (Kardar-Parisi-Zhang) model. In 2 + 1 dimensions, the values of the roughness and the dynamic exponents calculated from our theory go like α ≈ z ≈ 1 and in 1 + 1 dimensions, the exponents resemble the KPZ values for low vapor pressure, supporting experimental results. Interestingly, Galilean invariance is maintained throughout.",
keywords = "analytic method, article, mathematical analysis, molecular dynamics, molecular physics, nonbiological model, theory, vapor pressure",
author = "Chattopadhyay, {Amit K.}",
note = "{\circledC}2002 American Physical Society",
year = "2002",
month = "1",
day = "4",
doi = "10.1103/PhysRevB.65.041405",
language = "English",
volume = "65",
journal = "Physical Review B",
issn = "1098-0121",
publisher = "American Institute of Physics Publising LLC",
number = "4",

}

Thermal re-emission model. / Chattopadhyay, Amit K.

In: Physical Review B, Vol. 65, No. 4, 41405, 04.01.2002.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Thermal re-emission model

AU - Chattopadhyay, Amit K.

N1 - ©2002 American Physical Society

PY - 2002/1/4

Y1 - 2002/1/4

N2 - Starting from a continuum description, we study the nonequilibrium roughening of a thermal re-emission model for etching in one and two spatial dimensions. Using standard analytical techniques, we map our problem to a generalized version of an earlier nonlocal KPZ (Kardar-Parisi-Zhang) model. In 2 + 1 dimensions, the values of the roughness and the dynamic exponents calculated from our theory go like α ≈ z ≈ 1 and in 1 + 1 dimensions, the exponents resemble the KPZ values for low vapor pressure, supporting experimental results. Interestingly, Galilean invariance is maintained throughout.

AB - Starting from a continuum description, we study the nonequilibrium roughening of a thermal re-emission model for etching in one and two spatial dimensions. Using standard analytical techniques, we map our problem to a generalized version of an earlier nonlocal KPZ (Kardar-Parisi-Zhang) model. In 2 + 1 dimensions, the values of the roughness and the dynamic exponents calculated from our theory go like α ≈ z ≈ 1 and in 1 + 1 dimensions, the exponents resemble the KPZ values for low vapor pressure, supporting experimental results. Interestingly, Galilean invariance is maintained throughout.

KW - analytic method

KW - article

KW - mathematical analysis

KW - molecular dynamics

KW - molecular physics

KW - nonbiological model

KW - theory

KW - vapor pressure

UR - http://www.scopus.com/inward/record.url?eid=2-s2.0-0037081350&partnerID=40&md5=983f5dae3b4de05f78ad4fc7fecaafc7

UR - http://journals.aps.org/prb/abstract/10.1103/PhysRevB.65.041405

U2 - 10.1103/PhysRevB.65.041405

DO - 10.1103/PhysRevB.65.041405

M3 - Article

VL - 65

JO - Physical Review B

JF - Physical Review B

SN - 1098-0121

IS - 4

M1 - 41405

ER -