Thermal re-emission model

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Starting from a continuum description, we study the nonequilibrium roughening of a thermal re-emission model for etching in one and two spatial dimensions. Using standard analytical techniques, we map our problem to a generalized version of an earlier nonlocal KPZ (Kardar-Parisi-Zhang) model. In 2 + 1 dimensions, the values of the roughness and the dynamic exponents calculated from our theory go like α ≈ z ≈ 1 and in 1 + 1 dimensions, the exponents resemble the KPZ values for low vapor pressure, supporting experimental results. Interestingly, Galilean invariance is maintained throughout.
Original languageEnglish
Article number41405
Number of pages4
JournalPhysical Review B
Issue number4
Publication statusPublished - 4 Jan 2002

Bibliographical note

©2002 American Physical Society


  • analytic method
  • article
  • mathematical analysis
  • molecular dynamics
  • molecular physics
  • nonbiological model
  • theory
  • vapor pressure


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