A new regime for high rate growth of nanocrystalline diamond films using high power and CH4/H2/N2/O2 plasma

C.J. Tang, I. Abe, A.J.S. Fernandes, M.A. Neto, L.P. Gu, S. Pereira, H. Ye, X.F. Jiang, J.L. Pinto

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