Surface roughness reduction and diffraction efficiency optimisation for e-beam written phase masks

X. Liu, S. Thoms, J.S. Aitchison, R.M. De La Rue, John A.R. Williams, Lorna A. Everall, Ian Bennion

Research output: Contribution to journalArticle

Abstract

We report the control of surface relief grating parameters and roughness for phase masks produced using e-beam lithography (EBL) and reactive ion etching (RIE). The relationships between processing conditions, grating parameters, surface roughness and the diffraction efficiency of the zeroth and the two first order transmitted beams are discussed.
Original languageEnglish
Pages (from-to)199-202
Number of pages4
JournalMicroelectronic Engineering
Volume41-42
DOIs
Publication statusPublished - Mar 1998
EventInternational Conference on Micro- and Nano- Engineering (MNE'97) -
Duration: 1 Mar 19981 Mar 1998

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Diffraction efficiency
Masks
surface roughness
masks
Surface roughness
gratings
optimization
Reactive ion etching
Diffraction gratings
diffraction
Lithography
roughness
lithography
etching
Processing
ions

Bibliographical note

surface relief grating parameters and roughness, e-beam lithography, reactive ion etching, diffraction efficiency of the zeroth

Cite this

Liu, X. ; Thoms, S. ; Aitchison, J.S. ; De La Rue, R.M. ; Williams, John A.R. ; Everall, Lorna A. ; Bennion, Ian. / Surface roughness reduction and diffraction efficiency optimisation for e-beam written phase masks. In: Microelectronic Engineering. 1998 ; Vol. 41-42. pp. 199-202.
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abstract = "We report the control of surface relief grating parameters and roughness for phase masks produced using e-beam lithography (EBL) and reactive ion etching (RIE). The relationships between processing conditions, grating parameters, surface roughness and the diffraction efficiency of the zeroth and the two first order transmitted beams are discussed.",
author = "X. Liu and S. Thoms and J.S. Aitchison and {De La Rue}, R.M. and Williams, {John A.R.} and Everall, {Lorna A.} and Ian Bennion",
note = "surface relief grating parameters and roughness, e-beam lithography, reactive ion etching, diffraction efficiency of the zeroth",
year = "1998",
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doi = "10.1016/S0167-9317(98)00045-8",
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Surface roughness reduction and diffraction efficiency optimisation for e-beam written phase masks. / Liu, X.; Thoms, S.; Aitchison, J.S.; De La Rue, R.M.; Williams, John A.R.; Everall, Lorna A.; Bennion, Ian.

In: Microelectronic Engineering, Vol. 41-42, 03.1998, p. 199-202.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Surface roughness reduction and diffraction efficiency optimisation for e-beam written phase masks

AU - Liu, X.

AU - Thoms, S.

AU - Aitchison, J.S.

AU - De La Rue, R.M.

AU - Williams, John A.R.

AU - Everall, Lorna A.

AU - Bennion, Ian

N1 - surface relief grating parameters and roughness, e-beam lithography, reactive ion etching, diffraction efficiency of the zeroth

PY - 1998/3

Y1 - 1998/3

N2 - We report the control of surface relief grating parameters and roughness for phase masks produced using e-beam lithography (EBL) and reactive ion etching (RIE). The relationships between processing conditions, grating parameters, surface roughness and the diffraction efficiency of the zeroth and the two first order transmitted beams are discussed.

AB - We report the control of surface relief grating parameters and roughness for phase masks produced using e-beam lithography (EBL) and reactive ion etching (RIE). The relationships between processing conditions, grating parameters, surface roughness and the diffraction efficiency of the zeroth and the two first order transmitted beams are discussed.

U2 - 10.1016/S0167-9317(98)00045-8

DO - 10.1016/S0167-9317(98)00045-8

M3 - Article

VL - 41-42

SP - 199

EP - 202

JO - Microelectronic Engineering

JF - Microelectronic Engineering

SN - 0167-9317

ER -