We report the control of surface relief grating parameters and roughness for phase masks produced using e-beam lithography (EBL) and reactive ion etching (RIE). The relationships between processing conditions, grating parameters, surface roughness and the diffraction efficiency of the zeroth and the two first order transmitted beams are discussed.
|Number of pages||4|
|Publication status||Published - Mar 1998|
|Event||International Conference on Micro- and Nano- Engineering (MNE'97) - |
Duration: 1 Mar 1998 → 1 Mar 1998
Bibliographical notesurface relief grating parameters and roughness, e-beam lithography, reactive ion etching, diffraction efficiency of the zeroth
Liu, X., Thoms, S., Aitchison, J. S., De La Rue, R. M., Williams, J. A. R., Everall, L. A., & Bennion, I. (1998). Surface roughness reduction and diffraction efficiency optimisation for e-beam written phase masks. Microelectronic Engineering, 41-42, 199-202. https://doi.org/10.1016/S0167-9317(98)00045-8