Surface roughness reduction and diffraction efficiency optimisation for e-beam written phase masks

X. Liu, S. Thoms, J.S. Aitchison, R.M. De La Rue, John A.R. Williams, Lorna A. Everall, Ian Bennion

Research output: Contribution to journalArticle

Abstract

We report the control of surface relief grating parameters and roughness for phase masks produced using e-beam lithography (EBL) and reactive ion etching (RIE). The relationships between processing conditions, grating parameters, surface roughness and the diffraction efficiency of the zeroth and the two first order transmitted beams are discussed.
Original languageEnglish
Pages (from-to)199-202
Number of pages4
JournalMicroelectronic Engineering
Volume41-42
DOIs
Publication statusPublished - Mar 1998
EventInternational Conference on Micro- and Nano- Engineering (MNE'97) -
Duration: 1 Mar 19981 Mar 1998

Bibliographical note

surface relief grating parameters and roughness, e-beam lithography, reactive ion etching, diffraction efficiency of the zeroth

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